Thin film transistor array substrate
An organic light emitting diode (OLED) display device, and a method for manufacturing the OLED display device are discussed. The OLED display device according to one embodiment includes a substrate; a first bank pattern formed on the substrate and in an emission region and a non-emission region; a second bank pattern formed on the first bank pattern; an organic emission layer formed on the substrate in the emission region; and a planarization film formed on the substrate to include an opening under the first and second bank patterns in the non-emission region. The second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region.
1. An organic light emitting diode (OLED) display device, comprising:
a substrate formed in an emission region and a non-emission region;
an organic emission layer formed on the substrate in the emission region;
a planarization film formed on the substrate in the emission region and the non-emission region;
a first bank pattern formed on the substrate in the emission region and having a portion in an opening of the planarization film in the non-emission region; and
a second bank pattern formed on the first bank pattern and having a portion in the opening of the planarization film in the non-emission region, a bottom surface of the portion of the second bank pattern being wider than a top surface of the portion of the second bank pattern.
2. The OLED display device according to claim 1 , wherein the portion of the first bank pattern in the opening of the planarization film is a concave portion, and the portion of the second bank pattern is formed above the concave portion of the first bank pattern.
3. The OLED display device according to claim 2 , wherein a center of the portion of the second bank pattern is horizontally aligned with a center of the opening of the planarization film.
4. The OLED display device according to claim 3 , wherein the bottom surface of the portion of the second bank pattern that is wider than the top surface of the portion of the second bank pattern is positioned above a part of each of first and second color filter patterns.
5. The OLED display device according to claim 1 , further comprising:
a color filter layer formed directly below the first bank pattern in the non-emission region, the color filter layer including color filter patterns,
wherein a boundary region between the color filter patterns is below the opening of the planarization film.
6. The OLED display device according to claim 5 , wherein the planarization film is not disposed above the boundary region between the color filter patterns.
7. The OLED display device according to claim 5 , wherein the first bank pattern includes a concave portion to contact a thin portion of the planarization film that is in the opening of the planarization film.
8. The OLED display device according to claim 1 , further comprising:
a thin film transistor formed on the substrate in another non-emission region;
a first electrode formed on the thin film transistor; and
a contact hole formed in the another non-emission region to connect the first electrode to the thin film transistor.
9. The OLED display device according to claim 8 , wherein another portion of each of the first and second bank patterns is disposed on the first electrode in the contact hole.
10. The OLED display device according to claim 9 , wherein an edge of a concave portion of the first bank pattern formed in the non-emission region overlaps the first electrode at a side of the emission region, and an edge of another concave portion of the first bank pattern formed in the another non-emission region overlaps the first electrode at another side of the emission region.
11. An organic light emitting diode (OLED) display device, comprising:
a substrate;
a first bank pattern formed on the substrate and in an emission region and a non-emission region;
a second bank pattern formed on the first bank pattern;
an organic emission layer formed on the substrate in the emission region;
a planarization film formed on the substrate to include an opening under the first and second bank patterns in the non-emission region, wherein the second bank pattern is on the first bank pattern in the non-emission region, and the first bank pattern is in the opening of the planarization film in the non-emission region; and
a color filter layer formed directly below the first bank pattern in the non-emission region, the color filter layer including color filter patterns,
wherein a boundary region between the color filter patterns is below the opening of the planarization film.