Insulating glass unit comprising a sheet of glass with a fluorine doped tin oxide coating made from a gas stream comprising a nitric acid solution as oxidizing agent
The present invention provides low-E thin film optical stacks with improved optical and infrared reflecting properties and methods of making the same. More specifically, the present invention provides for a metal oxide thin film coating that exhibits lower emissivity values than its predecessor due to the inclusion of an oxidizer in the metal oxide deposition process, such as a strong acid such as nitric acid. The present invention also provides for a method that increases the coating efficiencies of the thin films described herein.
1. A method of making an insulating glass unit (IGU) comprising a first sheet of glass, a second sheet of glass, and a sealant assembly, the method comprising:
a) providing a first sheet of glass and a second sheet of glass;
b) depositing online, from a first coater positioned online, a first coating of an optical thin film coating on at least a portion of the first sheet of glass;
c) depositing online, from a second coater positioned online, a second coating of the optical thin film coating on at least a portion of the first coating, wherein the second coating comprises fluorine doped tin oxide; and
d) disposing a sealant assembly around the periphery of the first sheet of glass and the second sheet of glass for maintaining the first sheet and the second sheet in a spaced-apart relationship from each other;
wherein the second coating is deposited from a gas stream comprising at least one precursor gas and an oxidizing agent at an elevated temperature;
wherein the oxidizing agent is a solution of 10%-100% nitric acid.
2. The method of claim 1 , wherein the first coating comprises silicon.
3. The method of claim 1 , wherein the first coating comprises silicon in the form of an oxide, nitride or carbide or combinations thereof.
4. The method of claim 1 , wherein the first coating comprises a material selected from the group consisting of silicon oxide, silicon dioxide, silicon nitride, silicon oxynitride, silicon carbide or silicon oxycarbide or combinations thereof.
5. The method of claim 1 , wherein the first coating comprises silicon oxycarbide.
6. The method of claim 1 , wherein the elevated temperature is a temperature in the range of 200° C. to 800° C.
7. The method of claim 1 , wherein the elevated temperature is a temperature in the range of 450° C. to 750° C.
8. The method of claim 1 , wherein the first coating comprises a single layer.
9. The method of claim 1 , wherein the first coating comprises multiple layers.
10. A method of producing an insulating glass unit (IGU) comprising a first sheet of glass, a second sheet of glass, and a sealant assembly, the method comprising:
a) providing a first sheet of glass and a second sheet of glass;
b) depositing online, from a first coater positioned online, a first coating of an optical thin film coating on at least a portion of the first sheet of glass;
c) depositing online, from a second coater positioned online, a second coating of the optical thin film coating on at least a portion of the first coating, wherein the second coating comprises fluorine doped tin oxide, wherein the second coating is deposited from a gas stream comprising at least one precursor gas and an oxidizing agent at an elevated temperature; and
d) disposing a sealant assembly around the periphery of the first sheet of glass and the second sheet of glass for maintaining the first sheet and the second sheet in a spaced-apart relationship from each other;
wherein the oxidizing agent is a solution of 10%-100% nitric acid; and
wherein the second coating has an emissivity value that is at least about 0.04 lower than the emissivity value of a second coating deposited in the absence of nitric acid.
11. The method of claim 10 , wherein the first coating comprises silicon.
12. The method of claim 10 , wherein the first coating comprises silicon in the form of an oxide, nitride or carbide or combinations thereof.
13. The method of claim 10 , wherein the first coating comprises a material selected from the group consisting of silicon oxide, silicon dioxide, silicon nitride, silicon oxynitride, silicon carbide or silicon oxycarbide or combinations thereof.
14. The method of claim 10 , wherein the first coating comprises silicon oxycarbide.
15. The method of claim 10 , wherein the elevated temperature is a temperature in the range of 200° C. to 800° C.
16. The method of claim 10 , wherein the elevated temperature is a temperature in the range of 450° C. to 750° C.
17. The method of claim 10 , wherein the first coating comprises a single layer.
18. The method of claim 10 , wherein the first coating comprises multiple layers.
19. The method of claim 1 ,
wherein the second coating has a thickness that is at least about 20% greater than the thickness of a second coating deposited in the absence of nitric acid.
20. The method of claim 1 ,
wherein the second coating has a solar shading coefficient at least about 0.01 percent higher than the solar shading coefficient of a second coating of about the same thickness deposited in the absence of nitric acid.
21. The method of claim 1 , further comprising
depositing online, from a first precoater positioned online, a precoating on at least a portion of the first sheet of glass;
wherein the first coating is also deposited on at least a portion of the precoating; and further
wherein the second coating has an optical transmission rate at least about 0.9 percent higher than the optical transmission rate of a second coating of about the same thickness deposited in the absence of nitric acid.
22. The method of claim 1 ,
wherein the second coating has a haze at least about 0.25 percent lower than the haze of a second coating of about the same thickness deposited in the absence of nitric acid.
23. The method of claim 1 , further comprising
depositing online, from a first precoater positioned online, a precoating on at least a portion of the first sheet of glass;
wherein the first coating is also deposited on at least a portion of the precoating; and further
wherein the second coating has a haze at least about 0.25 percent lower than the haze of a second coating of about the same thickness deposited in the absence of nitric acid.
24. The method of claim 21 , wherein the precoating comprises a material selected from the group consisting of titanium oxide, titanium nitride, titanium carbide or oxycarbide or combinations thereof.
25. The method of claim 23 , wherein the precoating comprises a material selected from the group consisting of titanium oxide, titanium nitride, titanium carbide or oxycarbide or combinations thereof.
26. The method of claim 21 , wherein the precoating comprises titanium dioxide.
27. The method of claim 23 , wherein the precoating comprises titanium dioxide.