Ti—Al—Ta-based coating exhibiting enhanced thermal stability
A wear resistant coating system including a tantalum-containing multilayered film having n A layers and m B layers, where n and m are integral numbers larger than I, deposited alternating one on each other. The multilayered film exhibits crystalline cubic structure, and is characterized in that the B layers include tantalum and the A layers exhibit a higher defect density than the B layers.
1. Wear resistant coating system ( 20 ) comprising a tantalum containing multilayered film ( 10 ) consisting of n A layers ( 4 ) and m B layers ( 8 ), where n and m are integral numbers larger than 1, deposited alternate one on each other, said multilayered film ( 10 ) exhibiting crystalline cubic structure, characterized in that the B layers comprises tantalum and the A layers exhibit a higher defect density than the B layers.
2. Coating system according to claim 1 , characterized in that the chemical composition of the A and B layers is given by the formulas with the coefficients in atomic percentage:
Me 1 1-x Al x N z X 1-z for the A layers and Me 2 1-x-y Al x Ta y N z X 1-z , for the B layers, where:
Me 1 is one or more elements from: Ti, Cr, V, Ta, Nb, Zr, Hf, Mo, Si and W, and
Me 2 is one or more elements from: Ti, Cr, V, Nb, Zr, Hf, Mo, Si and W, and
X is one or more elements from: 0, C and B, and
0.2≦X≦0.7, 0.7≦Z≦1, 0.02≦y≦0.80.
3. Coating system according to claim 2 , characterized in that the thickness of the B layers is smaller than the thickness of the A layers: A 1 >B 1 , A 2 >B 2 , A 3 >B 3 . . . An>Bm.
4. Coating system according to claim 3 , characterized in that the thickness of the A layers is at least 15% larger than the thickness of the B layers: A 1 ≧1.15 B 1 , A 2 ≧1.15 B 2 , A 3 ≧1.15 B 3 . . . An≧1.15 Bm.
5. Coated body comprising a body ( 1 ) and a coating system ( 20 ) according to claim 1 deposited on at least a portion of the surface of the body ( 1 ).
6. Coated body according to claim 4 , characterized in that the multilayered film ( 10 ) of the coating system ( 20 ) is deposited by means of PVD techniques.
7. Coated body according to claim 6 , characterized in that the B layers of the multilayered film ( 10 ) are deposited by means of magnetron sputtering ion plating techniques or high ionization magnetron sputtering techniques.
8. Coated body according to claim 6 , characterized in that the A layers are deposited by means of arc ion plating techniques.
9. Method of manufacturing a coated body according to claim 5 , characterized in that the A layers and/or the B layers are deposited on the substrate by means of PVD techniques.
10. Method according to claim 9 , characterized in that by depositing the A layers and/or the B layers reactive physical vapor deposition techniques are used.
11. Method according to claim 10 , characterized in that the nitrogen fraction and/or at least one of the elements comprised in the X component of the coating system are incorporated from a reactive gas or from a reactive gas mixture in the A and/or B layers, respectively.
12. Method according to claim 9 , characterized in that the multilayered film ( 10 ), i.e. both the A- and B-layers are deposited by means of arc ion plating techniques.
13. Method according to claim 12 , characterized in that for adjusting the desired defect density in the layers A and B the coil current is adjusted correspondingly.
14. Method according to claim 9 , characterized in that at least one target used as source material for depositing the A- and/or B-layers is made by powder metallurgy techniques.