IP Library › Granted Patent US 9,514,880
Granted Patent B2
US 9,514,880 · App. 14/460,022 · Granted Dec 6, 2016

Coil unit for thin film inductor, manufacturing method of coil unit for thin film inductor, thin film inductor and manufacturing method of thin film inductor

Inventors: Jeong Woo Park (Suwon-si, KR); Seon Ha Kang (Suwon-si, KR); Oh Hi Lee (Busan, KR)
Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
H01F41/041H01F17/0013H01F41/046H01F2017/0066Y10T29/49071
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Quick Facts
Patent No.
US 9,514,880
App. No.
14/460,022
Granted
Dec 6, 2016
Kind
B2
Abstract

Embodiments of the invention provide a coil unit for a thin film inductor, a manufacturing method of a coil unit for a thin film inductor, a thin film inductor, and a manufacturing method of a thin film inductor. According to an embodiment, there is provided a coil unit for a thin film inductor. The coil unit includes an insulator having a dual insulating layer of different materials, and coil patterns respectively embedded in upper and lower surfaces of the insulator. The coil patterns include a coil pattern formed of a plurality of plating layers.

Claims (14)

1. A coil unit for a thin film inductor, comprising:

a first insulating layer;

a second insulating layer disposed on the first insulating layer;

a first coil pattern embedded in the first insulating layer; and

a second coil pattern embedded in the second insulating layer,

wherein a number of plating layers forming the first coil pattern is different from a number of plating layers forming the second coil pattern, and at least one of the first and second coil patterns is formed of three or more plating layers.

2. The coil unit for the thin film inductor according to claim 1 , wherein the first insulating layer is made of a mixture of prepreg and resin, and the second insulating layer is made of resin.

3. The coil unit for the thin film inductor according to claim 1 , wherein the first insulating layer is made of resin, and the second insulating layer is made of a mixture of prepreg and resin.

4. The coil unit for the thin film inductor according to claim 1 , further comprising:

a conductive via hole for electrically connecting the first coil pattern and the second coil pattern.

5. The coil unit for the thin film inductor according to claim 1 , wherein an insulating resist is formed in a portion of the first coil pattern, which is exposed from the lower surface of the first insulating layer, and a portion of the second coil pattern, which is exposed from the upper surface of the second insulating layer.

6. A thin film inductor, comprising:

a coil unit for a thin film inductor according to claim 1 ; and

a magnetic material bonded to at least one of the upper and lower surfaces of the coil unit for the thin film inductor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 14, 2014
From: PARK, JEONG WOO; KANG, SEON HA; LEE, OH HI
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 033539/0679 →
Priority Claims (1)
KR 10-2013-0096649 · Aug 14, 2013 · national
Continuity (1)
Related Publication 20150048918A1 · Feb 19, 2015