Semiconductor device and method of fabricating the same
A semiconductor device may include a strain relaxed buffer layer provided on a substrate to contain silicon germanium, a semiconductor pattern provided on the strain relaxed buffer layer to include a source region, a drain region, and a channel region connecting the source region with the drain region, and a gate electrode enclosing the channel region and extending between the substrate and the channel region. The source and drain regions may contain germanium at a concentration of 30 at % or higher.
1. A semiconductor device, comprising:
a substrate including a first region and a second region;
a strain relaxed buffer layer provided on the substrate, the strain relaxed buffer layer comprising silicon germanium;
a first transistor provided on the strain relaxed buffer layer of the first region, the first transistor including a first channel region protruding from the substrate and a first gate electrode covering a side surface of the first channel region; and
a second transistor provided on the strain relaxed buffer layer of the second region, the second transistor including a second channel region and a second gate electrode enclosing the second channel region and extending between the substrate and the second channel region,
wherein the first and second channel regions comprise silicon, and a germanium concentration of the second channel region is higher than that of the first channel region.
2. The semiconductor device of claim 1 , wherein the first channel includes a silicon layer and the second channel includes a silicon germanium layer.
3. The semiconductor device of claim 2 , wherein the second transistor further includes source/drain region at both sides of the second channel, and
the source/drain region includes a silicon germanium layer and the source/drain region has a germanium concentration that is higher than that of the strain relaxed buffer layer.
4. The semiconductor device of claim 2 , wherein the source/drain region comprises germanium at a concentration of 30 at % or more.
5. The semiconductor device of claim 1 , wherein the first and second gate electrodes comprise an aluminum-containing metal layer.
6. The semiconductor device of claim 5 , wherein an aluminum concentration of the first gate electrode is higher than that of the second gate electrode.
7. The semiconductor device of claim 5 , wherein the first and second gate electrodes further comprise a tungsten layer provided on the metal layer.
8. The semiconductor device of claim 5 , wherein the first transistor comprises an NMOS transistor and the second transistor comprises a PMOS transistor.