Semiconductor device, method for manufacturing semiconductor device, and electronic device
Threshold voltage adjustment method of a semiconductor device is provided. In a semiconductor device in which at least one of transistors included in an inverter includes a semiconductor, a source electrode or a drain electrode electrically connected to the semiconductor, a gate electrode, and a charge trap layer provided between the gate electrode and the semiconductor, the potential of the gate electrode of the transistor that is higher than those of the source electrode and the drain electrode is held for a short time of 5 s or shorter, whereby electrons are trapped in the charge trap layer and the threshold voltage is increased. At this time, when the potential differences between the gate electrode and the source electrode, and the gate electrode and the drain electrode are different from each other, the threshold voltage of the transistor of the semiconductor device becomes appropriate.
1. A semiconductor device comprising:
a first transistor; and
a second transistor,
wherein the first transistor comprises:
a first oxide semiconductor;
a first electrode over the first oxide semiconductor, the first electrode being electrically connected to the first oxide semiconductor;
a first charge trap layer over the first oxide semiconductor and the first electrode; and
a first gate electrode over the first charge trap layer, the first gate electrode overlapping the first oxide semiconductor,
wherein the second transistor comprises:
a second oxide semiconductor;
a second electrode over the second oxide semiconductor, the second electrode being electrically connected to the second oxide semiconductor and the first oxide semiconductor;
a second charge trap layer over the second oxide semiconductor and the second electrode; and
a second gate electrode over the second charge trap layer, the second gate electrode overlapping the second oxide semiconductor and being electrically connected to the second electrode,
wherein the first transistor further comprises a third oxide semiconductor over the first electrode,
wherein the third oxide semiconductor is in contact with a top surface of the first oxide semiconductor and a side surface of the first oxide semiconductor,
wherein the second transistor further comprises a fourth oxide semiconductor over the second electrode,
wherein the fourth oxide semiconductor is in contact with a top surface of the second oxide semiconductor and a side surface of the second oxide semiconductor, and
wherein the number of electrons held in the first charge trap layer is larger than the number of electrons held in the second charge trap layer.
2. The semiconductor device according to claim 1 , wherein the first charge trap layer and the second charge trap layer each contain any one of hafnium oxide, aluminum oxide, and aluminum silicate.
3. The semiconductor device according to claim 1 , wherein the first electrode is a source electrode or a drain electrode.
4. The semiconductor device according to claim 1 , further comprising a fifth oxide semiconductor under the first oxide semiconductor.
5. The semiconductor device according to claim 1 ,
wherein the first charge trap layer includes a first insulating layer, a second insulating layer over the first insulating layer, and a third insulating layer over the second insulating layer, and
wherein the second insulating layer contains any one of hafnium oxide, aluminum oxide, and aluminum silicate.
6. The semiconductor device according to claim 1 , wherein the first transistor is an enhancement-mode transistor.
7. The semiconductor device according to claim 1 , wherein the second transistor is a depletion-mode transistor.
8. An electronic device comprising:
the semiconductor device according to claim 1 ; and
a display device.
9. An electronic device comprising:
the semiconductor device according to claim 1 ; and
a battery.
10. The semiconductor device according to claim 1 , wherein the second gate electrode is in contact with the second electrode.
11. A semiconductor device comprising:
a first transistor;
a second transistor;
a planarization film over the first transistor and the second transistor; and
a wiring over the planarization film,
wherein the first transistor comprises:
a first oxide semiconductor;
a first electrode over the first oxide semiconductor, the first electrode being electrically connected to the first oxide semiconductor;
a first charge trap layer over the first oxide semiconductor and the first electrode; and
a first gate electrode over the first charge trap layer, the first gate electrode overlapping the first oxide semiconductor,
wherein the second transistor comprises:
a second oxide semiconductor;
a second electrode over the second oxide semiconductor, the second electrode being electrically connected to the second oxide semiconductor and the first oxide semiconductor;
a second charge trap layer over the second oxide semiconductor and the second electrode; and
a second gate electrode over the second charge trap layer, the second gate electrode overlapping the second oxide semiconductor and being electrically connected to the second electrode via the wiring,
wherein the first transistor further comprises a third oxide semiconductor over the first electrode,
wherein the third oxide semiconductor is in contact with a top surface of the first oxide semiconductor and a side surface of the first oxide semiconductor,
wherein the second transistor further comprises a fourth oxide semiconductor over the second electrode,
wherein the fourth oxide semiconductor is in contact with a top surface of the second oxide semiconductor and a side surface of the second oxide semiconductor, and
wherein the number of electrons held in the first charge trap layer is larger than the number of electrons held in the second charge trap layer.
12. The semiconductor device according to claim 11 , wherein the first charge trap layer and the second charge trap layer each contain any one of hafnium oxide, aluminum oxide, and aluminum silicate.
13. The semiconductor device according to claim 11 , wherein the first electrode is a source electrode or a drain electrode.
14. The semiconductor device according to claim 11 , further comprising a fifth oxide semiconductor under the first oxide semiconductor.
15. The semiconductor device according to claim 11 ,
wherein the first charge trap layer includes a first insulating layer, a second insulating layer over the first insulating layer, and a third insulating layer over the second insulating layer, and
wherein the second insulating layer contains any one of hafnium oxide, aluminum oxide, and aluminum silicate.
16. The semiconductor device according to claim 11 , wherein the first transistor is an enhancement-mode transistor.
17. The semiconductor device according to claim 11 , wherein the second transistor is a depletion-mode transistor.
18. An electronic device comprising:
the semiconductor device according to claim 11 ; and
a display device.
19. An electronic device comprising:
the semiconductor device according to claim 11 ; and
a battery.