Dielectric grid bottom profile for light focusing

1. A back-side illuminated (BSI) image sensor comprising:

a pixel sensor arranged within a semiconductor substrate;

a metallic grid arranged over the pixel sensor and defining a sidewall of a metallic grid opening;

a dielectric grid arranged over the metallic grid and defining a sidewall of a dielectric grid opening;

a capping layer arranged over the metallic grid, and defining a curved lower surface of the dielectric grid opening; and

a dielectric grid layer arranged over the capping layer and defining the dielectric grid, wherein the curved lower surface is convex and arranged below a bottom surface of the dielectric grid layer, and wherein the bottom surface of the dielectric grid layer is spaced between a top surface of the dielectric grid layer and a top surface of the capping layer.

2. The BSI image sensor according to claim 1 , further comprising:

a color filter arranged within the dielectric grid opening and abutting the curved lower surface.

3. The BSI image sensor according to claim 2 , wherein the color filter has a refractive index less than that of the capping layer.

4. The BSI image sensor according to claim 1 , further comprising:

a back-end-of-line (BEOL) metallization stack arranged on an opposite side of the semiconductor substrate as the metallic grid.

5. A back-side illuminated (BSI) image sensor comprising:

a plurality of pixel sensors arranged within a semiconductor substrate;

a metallic grid arranged over the pixel sensors and defining sidewalls of metallic grid openings corresponding to the pixel sensors;

a dielectric grid arranged over the metallic grid and defining sidewalls of dielectric grid openings corresponding to the pixel sensors;

a capping layer arranged over the metallic grid, and defining curved lower surfaces of the dielectric grid openings, wherein the curved lower surfaces comprise a curved lower surface that is curved so outer edges of the curved lower surface are closer to the semiconductor substrate than a center of the curved lower surface;

a dielectric grid layer arranged over the capping layer, wherein the dielectric grid is arranged in the dielectric grid layer; and

an etch stop layer arranged between the dielectric grid layer and the capping layer, wherein the etch stop layer is a different material than the dielectric grid layer, wherein the etch stop layer has a bottom surface that is spaced above the curved lower surfaces of the dielectric grid openings and that contacts the capping layer.

6. The BSI image sensor according to claim 5 , wherein the curved lower surfaces are convex.

7. The BSI image sensor according to claim 5 , further comprising:

color filters arranged within the dielectric grid openings and directly abutting the curved lower surfaces.

8. The BSI image sensor according to claim 7 , wherein the curved lower surfaces are convex, and wherein the color filters have refractive indexes less than a refractive index of the capping layer.

9. An image sensor comprising:

a semiconductor substrate arranged over a back-end-of-line (BEOL) metallization stack, and comprising an array of pixel sensors arranged in the semiconductor substrate;

a metallic layer arranged over the semiconductor substrate and comprising an array of metallic grid openings corresponding to the pixel sensors, wherein the array of metallic grid openings define a metallic grid in the metallic layer;

a dielectric layer arranged over the metallic layer and comprising an array of dielectric grid openings corresponding to the pixel sensors, wherein the array of dielectric grid openings define a dielectric grid in the dielectric layer;

color filters arranged in the dielectric grid openings;

a capping layer arranged over the metallic layer, between the metallic and dielectric layers, wherein the capping layer fills the metallic grid openings and defines curved lower surfaces of the dielectric grid openings, and wherein the capping layer laterally contacts substantially vertical sidewalls of the color filters;

an antireflective layer arranged over and contacting the semiconductor substrate; and

a buffer layer arranged over and contacting the antireflective layer, wherein the capping layer and the metallic layer are arranged over and contact the buffer layer.

10. The image sensor according to claim 9 , wherein the curved lower surfaces are convex.

11. The image sensor according to claim 9 , further comprising:

color filters arranged in the dielectric grid openings and having different indexes of refraction than the capping layer.

12. The BSI image sensor according to claim 1 , further including:

an etch stop layer overlying the capping layer, between the capping layer and the dielectric grid layer, wherein the etch stop layer contacts the bottom surface of the dielectric grid layer and an upper surface of the capping layer, and wherein the curved lower surface is arranged below a bottom surface of the etch stop layer.

13. The BSI image sensor according to claim 12 , further comprising:

a color filter arranged within the dielectric grid opening, wherein the dielectric grid layer has an upper surface that is even with an upper surface of the color filter.

14. The BSI image sensor according to claim 1 , further including:

an etch stop layer arranged between and contacting the dielectric grid layer and the capping layer, wherein the etch stop layer is a different material than the dielectric grid layer.

15. The BSI image sensor according to claim 5 , wherein the etch stop layer contacts the dielectric grid and capping layers.

16. The BSI image sensor according to claim 15 , wherein the etch stop layer is arranged along a bottom of the dielectric grid openings.

17. The image sensor according to claim 10 , further comprising:

an etch stop layer arranged between and contacting the dielectric layer and the capping layer, wherein the curved lower surfaces are arranged below a bottom surface of the etch stop layer.