Method for forming a semiconductor device having insulating parts or layers formed via anodic oxidation

1. A method for forming a semiconductor device, the method comprising:

forming an electrical structure at a main surface of a semiconductor substrate;

carrying out an anodic oxidation of a back side surface region of a back side surface of the semiconductor substrate to form an oxide layer at the back side surface of the semiconductor substrate after forming the electrical structure at the main surface; and

forming an electrically conductive layer at the back side of the semiconductor substrate, wherein a first part of the electrically conductive layer is directly separated from the back side surface of the semiconductor substrate by the oxide layer formed by the anodic oxidation and a second part of the electrically conductive layer is formed directly on the back side surface of the semiconductor substrate.

2. A method for forming a semiconductor device, the method comprising:

forming an electrical structure at a main surface of a semiconductor substrate;

carrying out an anodic oxidation of a back side surface region of a back side surface of the semiconductor substrate to form an oxide layer at the back side surface of the semiconductor substrate; and

forming an electrically conductive layer at the back side of the semiconductor substrate, wherein at least a part of the electrically conductive layer is directly separated from the back side surface of the semiconductor substrate by the oxide layer formed by the anodic oxidation;

wherein the oxide layer remains at least at an edge termination region surrounding the semiconductor substrate, wherein the edge termination region is a region extending from an edge of the semiconductor substrate laterally towards an emitter region of an insulated gate bipolar transistor or a drain region of a metal oxide semiconductor transistor located at the back side within the semiconductor substrate.

3. A method for forming a semiconductor device, the method comprising:

forming an electrical structure at a main surface of a semiconductor substrate;

carrying out an anodic oxidation of a back side surface region of a back side surface of the semiconductor substrate to form an oxide layer at the back side surface of the semiconductor substrate; and

forming a p-doped region adjacent to an n-doped region at the back side surface of the semiconductor substrate before the anodic oxidation, wherein the oxide layer in a first portion of the back side surface extending along the n-doped region has a greater thickness than the oxide layer in a second portion of the back side surface extending along the p-doped region,

wherein the electrical structure at the main surface is more complex than the p-doped region and the n-doped region formed at the back side surface.

4. The method according to claim 3 , further comprising removing the oxide layer within the second portion.

5. The method according to claim 3 , comprising implanting dopants at the first portion and the second portion to form a stepped field stop region at least at the second portion.

6. A method for forming a semiconductor device, the method comprising:

forming an electrical structure at a main surface of a semiconductor substrate;

carrying out an anodic oxidation of a back side surface region of a back side surface of the semiconductor substrate to form an oxide layer at the back side surface of the semiconductor substrate after forming the electrical structure at the main surface; and

forming a field effect transistor structure at the back side of the semiconductor substrate, wherein the oxide layer forms a gate oxide of the field effect transistor structure at the back side.