Mechanical resonating structures including a temperature compensation structure
Mechanical resonating structures are described, as well as related devices and methods. The mechanical resonating structures may have a compensating structure for compensating temperature variations.
1. A device, comprising:
a substrate having a cavity formed therein; and
a mechanical resonating structure suspended above the cavity and coupled to the substrate by an anchor, the mechanical resonating structure comprising
a multi-layer active layer comprising a piezoelectric functional layer and a non-functional layer; and
a temperature compensating structure coupled to the active layer and comprising first, second and third layers, the second layer being between the first and third layers,
wherein the first and third layers of the temperature compensating structure are formed of silicon oxide and have a stiffness that increases with increasing temperature over a temperature range, and wherein the second layer of the temperature compensating structure is formed of a semiconductor material.
2. The device of claim 1 , wherein the silicon oxide of the first layer of the temperature compensating structure is a thermal silicon oxide.
3. The device of claim 1 , wherein a ratio of a thickness of the active layer to a combined thickness of the first and third layers of the temperature compensating structure is between 1:1 and 1:200.
4. The device of claim 3 , wherein the ratio of the thickness of the active layer to the combined thickness of the first and third layers of the temperature compensating structure is between 1:1 and 1:10.
5. The device of claim 2 , wherein the second layer of the temperature compensating structure comprises single crystal silicon.
6. The device of claim 1 , wherein the mechanical resonating structure is configured to support Lamb waves.
7. The device of claim 1 , wherein the mechanical resonating structure comprises a first electrode and a second electrode, wherein the piezoelectric functional layer of the multi-layer active layer is between the first and second electrodes.
8. The device of claim 7 , wherein the first electrode forms at least part of an interdigitated electrode.
9. The device of claim 1 , wherein the temperature compensating structure provides the mechanical resonating structure with a temperature coefficient of frequency having an absolute value less than 10 ppm/K over a temperature range from −40° C. to 85° C.
10. A device, comprising:
a mechanical resonating structure suspended above a cavity in a substrate and coupled to the substrate by an anchor, the mechanical resonating structure comprising
an active layer of a piezoelectric material;
a crystal orientation layer;
an electrode disposed between the active layer and the crystal orientation layer; and
a temperature compensating structure coupled to the active layer such that the crystal orientation layer is between the electrode and the temperature compensating structure,
wherein the temperature compensating structure comprises first, second and third layers, the second layer being between the first and third layers, wherein the first and third layers of the temperature compensating structure are formed of silicon oxide and have a stiffness that increases with increasing temperature over a temperature range, and wherein the second layer of the temperature compensating structure is formed of a semiconductor material.
11. The device of claim 10 , wherein the silicon oxide of the first layer of the temperature compensating structure is a thermal silicon oxide.
12. The device of claim 11 , wherein the second layer of the temperature compensating structure comprises single crystal silicon.
13. The device of claim 12 , wherein a ratio of a thickness of the active layer to a combined thickness of the first and third layers of the temperature compensating structure is between 1:1 and 1:10.
14. The device of claim 10 , wherein the temperature compensating structure provides the mechanical resonating structure with a temperature coefficient of frequency having an absolute value less than 10 ppm/K over a temperature range from −40° C. to 85° C.