Silicon carbide semiconductor devices having nitrogen-doped interface
Methods, systems, and devices are disclosed for implementing high power circuits and semiconductor devices. In one aspect, a method for fabricating a silicon carbide semiconductor device includes forming a thin epitaxial layer of a nitrogen doped SiC material on a SiC epitaxial layer formed on a SiC substrate, and thermally growing an oxide layer to form an insulator material on the nitrogen doped SiC epitaxial layer, in which the thermally grown oxide layer results in at least partially consuming the nitrogen doped SiC epitaxial layer in the oxide layer to produce an interface including nitrogen between the SiC epitaxial layer and the oxide layer.
1. A method for fabricating a silicon carbide (SiC) device, comprising:
forming a thin epitaxial layer of a nitrogen doped SiC material on a SiC epitaxial layer formed on a SiC substrate; and
thermally growing an oxide layer to form an insulator material on the nitrogen doped SiC epitaxial layer,
wherein the thermally growing the oxide layer results in at least partially consuming the nitrogen doped SiC epitaxial layer in the oxide layer to produce an interface including nitrogen between the nitrogen doped SiC epitaxial layer and the oxide layer to create in the interface a spatial variation of a nitrogen concentration that decreases in distance from the nitrogen-doped SiC epitaxial layer below the interface to the oxide layer above the interface.
2. The method as in claim 1 , wherein the insulator material includes silicon oxide.
3. The method as in claim 1 , wherein the oxide layer is grown at a high temperature within a range 900° C. to 1200° C. in an oxidizing environment.
4. The method as in claim 1 , wherein the nitrogen doped SiC epitaxial layer has a thickness less than 500 nm.
5. The method as in claim 1 , wherein the nitrogen doped SiC material has a carrier concentration greater than 1×10 18 cm −3 .
6. The method as in claim 1 , further comprising forming one or more transistor structures over the insulator material of the oxide layer.
7. The method as in claim 1 , wherein the SiC epitaxial layer includes an n-type SiC epitaxial layer.
8. The method as in claim 1 , wherein the nitrogen doped SiC epitaxial layer includes a nitrogen doped n-type SiC epitaxial layer.
9. A method for forming a transistor over a SiC substrate, comprising:
forming a SiC epitaxial layer over a SiC substrate;
forming a source region and a gate region over the SiC epitaxial layer;
forming a thin epitaxial layer of a nitrogen doped SiC material on over the gate region over the SiC epitaxial layer;
growing an oxide layer to form an insulator material on the nitrogen doped SiC epitaxial layer to form an interface that includes nitrogen between the nitrogen doped SiC epitaxial layer and the oxide layer without performing post oxidation gas annealing to create in the interface a spatial variation of a nitrogen concentration that decreases in distance from the nitrogen-doped SiC epitaxial layer below the interface to the oxide layer above the interface; and
forming a source conductive contact over the source region and a gate conductive contact over the gate region as part of a transistor.
10. The method of claim 9 , wherein the SiC epitaxial layer includes an n-type SiC epitaxial layer.
11. The method of claim 9 , wherein the nitrogen doped SiC material includes a nitrogen doped n-type SiC material.
12. A method for fabricating a silicon carbide (SiC) device, comprising:
forming a thin epitaxial layer of a nitrogen doped SiC material on a SiC epitaxial layer formed on a SiC substrate;
thermally growing an oxide layer to form an insulator material on the nitrogen doped SiC epitaxial layer; and
controlling the thermally growing the oxide layer to cause the nitrogen doped SiC epitaxial layer in the oxide layer to be at least partially consumed to produce an interface including nitrogen between the nitrogen doped SiC epitaxial layer and the oxide layer so that the interface has a spatial variation of a nitrogen concentration that decreases in distance from the nitrogen-doped SiC epitaxial layer below the interface to the oxide layer above the interface.
13. The method as in claim 12 , wherein the insulator material includes silicon oxide and wherein the oxide layer is grown at a high temperature within a range 900° C. to 1200° C. in an oxidizing environment.
14. The method as in claim 12 , wherein the nitrogen doped SiC epitaxial layer has a thickness less than 500 nm.
15. The method as in claim 12 , further comprising forming one or more transistor structures over the insulator material of the oxide layer.
16. The method of claim 12 , wherein the SiC epitaxial layer includes an n-type SiC epitaxial layer.
17. The method of claim 12 , wherein the nitrogen doped SiC material includes a nitrogen doped n-type SiC material.