Solid-state image pickup device, method of manufacturing solid-state image pickup device, and electronic apparatus
There is provided a solid-state image pickup device including: a semiconductor substrate ( 21 ); a photodiode ( 11 A, 11 B) formed in the semiconductor substrate; a transistor ( 10 ) having a gate electrode ( 14 ) part or all of which is embedded in the semiconductor substrate, the transistor being configured to read a signal electric charge from the photodiode via the gate electrode; and an electric charge transfer layer ( 13 ) provided between the gate electrode and the photodiode.
1. A solid-state image pickup device, comprising:
a semiconductor substrate;
a photodiode formed in the semiconductor substrate;
a transistor having a gate electrode, at least a portion of the gate electrode being embedded in the semiconductor substrate, the transistor being configured to read a signal electric charge from the photodiode via the gate electrode, wherein at least a portion of the photodiode is formed directly over at least a portion of the gate electrode in a depth direction of the semiconductor substrate; and
an electric charge transfer layer provided in contact with the gate electrode and the photodiode.
2. The solid-state image pickup device according to claim 1 , wherein the photodiode is one of a plurality of photodiodes that are laminated in the depth direction of the semiconductor substrate.
3. The solid-state image pickup device according to claim 1 , wherein the photodiode includes a photoelectric conversion layer of a first conductivity type, and the electric charge transfer layer is an impurity diffusion layer of the first conductivity type connected to a portion of the photoelectric conversion layer.
4. The solid-state image pickup device according to claim 1 , wherein at least a portion of the gate electrode fills a concave section, the concave section being formed in the semiconductor substrate, and at least a portion of the electric charge transfer layer is connected to the gate electrode at a bottom face of the concave section.
5. The solid-state image pickup device according to claim 4 , wherein the electric charge transfer layer is formed adjacent to the bottom face of the concave section.
6. The solid-state image pickup device according to claim 4 , further comprising a dark current suppression layer of a second conductivity type in contact with the electric charge transfer layer and the bottom face of the concave section.
7. The solid-state image pickup device according to claim 4 , wherein the electric charge transfer layer covers the bottom face of the concave section and a portion of side faces of the concave section.
8. A method of manufacturing a solid-state image pickup device, the method, comprising:
forming a transistor having a gate electrode, at least a portion of the gate electrode being embedded in a semiconductor substrate that includes a photodiode, the transistor being configured to read a signal electric charge from the photodiode via the gate electrode, wherein at least a portion of the photodiode is formed directly over at least a portion of the gate electrode in a depth direction of the semiconductor substrate; and
forming an electric charge transfer layer in contact with the gate electrode and the photodiode.
9. The method according to claim 8 , wherein the photodiode is one of a plurality of photodiodes that are laminated in the depth direction of the semiconductor substrate.
10. The method according to claim 8 , wherein the photodiode includes a photoelectric conversion layer of a first conductivity type, and the electric charge transfer layer is an impurity diffusion layer of the first conductivity type connected to a portion of the photoelectric conversion layer.
11. The method according to claim 8 , wherein a concave section is formed in the semiconductor substrate during the forming of the transistor, and the gate electrode is formed to fill the concave section.
12. The method according to claim 11 , wherein the electric charge transfer layer is formed by ion implantation through a bottom face of the concave section after forming the concave section and before forming the gate electrode.
13. The method according to claim 11 , further comprising:
forming a dark current suppression layer of a second conductivity type by ion implantation through a bottom face of the concave section after forming the electric charge transfer layer and before forming the gate electrode,
wherein the electric charge transfer layer is formed by ion plantation through the bottom face of the concave section after forming the concave section and before forming the gate electrode.
14. The method according to claim 11 , wherein the electric charge transfer layer is formed by performing ion implantation through a selective region in the semiconductor substrate after forming the photodiode and before forming the concave section.
15. An electronic apparatus with a solid-state image pickup device according to claim 1 .
16. A method for driving a solid-state image pickup device, the solid-state image pickup device comprising:
a semiconductor substrate;
a first photodiode formed in the semiconductor substrate;
a second photodiode formed in the semiconductor substrate;
a transistor having a gate electrode, at least a portion of the gate electrode being embedded in the semiconductor substrate; and
a floating diffusion region embedded in the semiconductor substrate;
wherein at least a portion of the first photodiode is formed directly over at least a portion of the gate electrode in a depth direction of the semiconductor substrate, and
wherein a first charge of the first photodiode is transferred through the gate electrode to the floating diffusion, and a second charge of the second photodiode is transferred through the gate electrode to the floating diffusion region.
17. The method according to claim 16 , wherein the first photodiode is one of a plurality of photodiodes that are laminated in the depth direction of the semiconductor substrate.
18. The method according to claim 16 , wherein the first photodiode includes a photoelectric conversion layer of a first conductivity type, and an electric charge transfer layer is an impurity diffusion layer of the first conductivity type connected to a portion of the photoelectric conversion layer.
19. The method according to claim 16 , wherein a concave section is formed in the semiconductor substrate during the forming of the transistor, and the gate electrode is formed to fill the concave section.
20. The method according to claim 19 , wherein an electric charge transfer layer is formed by ion implantation through a bottom face of the concave section after forming the concave section and before forming the gate electrode.