Curable resin composition, production method of image sensor chip using the same, and image sensor chip
There is provided a curable resin composition which is capable of being coated on a solid-state imaging device substrate and contains a dye having a maximum absorption wavelength in a wavelength range from 600 to 850 nm, a production method of image sensor chip comprising a step of coating the curable resin composition on a solid-state imaging device substrate to form a dye-containing layer, and a step of adhering a glass substrate having an infrared ray reflecting film onto the dye-containing layer, and an image sensor chip comprising a solid-state imaging device substrate and a dye-containing layer composed of the curable resin composition.
1. An image sensor chip comprising a solid-state imaging device substrate, a dye-containing layer composed of a curable resin composition and a glass substrate having an infrared ray reflecting film,
wherein:
these members are closely contacted with each other without intervention of an air layer;
the infrared ray reflecting film is provided between the dye-containing layer composed of the curable resin composition and the glass substrate; and
the curable resin composition is a curable resin composition which is capable of being coated on a solid-state imaging device substrate and contains a dye having a maximum absorption wavelength in a wavelength range from 600 to 850 nm.
2. The image sensor chip as claimed in claim 1 ,
wherein an antireflection film is further provided on an outermost surface of the image sensor chip comprising the solid-state imaging device substrate, the dye-containing layer and the infrared ray reflecting film.