Anodization architecture for electro-plate adhesion
To manufacture a chamber component for a processing chamber a first anodization layer is formed on a metallic article with impurities, the first anodization layer having a thickness greater than about 100 nm, and an aluminum coating is formed on the first anodization layer, the aluminum coating being substantially free from impurities. A second anodization layer can be formed on the aluminum coating.
1. A method of manufacturing a chamber component for a processing chamber comprising:
anodizing a metallic article comprising impurities to form a first anodization layer, wherein the first anodization layer has a plurality of pores and a thickness greater than about 100 nm, and wherein anodizing the metallic article comprises:
initially using a first current density for the anodizing to grow a dense barrier layer portion of the anodization layer; and
subsequently using a lower second current density for the anodizing to grow a porous columnar layer portion of the anodization layer;
heating the metallic article comprising the first anodization layer to a temperature in a range from about 95 degrees C. to about 150 degrees C. for a time to remove moisture from the plurality of pores; and
forming an aluminum coating on the first anodization layer after the heating, the aluminum coating being substantially free from impurities.
2. The method of claim 1 , wherein the aluminum coating has a thickness in a range from about 20 microns to about 80 microns.
3. The method of claim 1 , wherein the time is in a range from about 2 hours to about 12 hours, and wherein a wet clean process is not performed on the metallic article between the anodizing and the heating.
4. The method of claim 1 further comprising anodizing the aluminum coating to form a second anodization layer.
5. The method of claim 4 , wherein the second anodization layer has a thickness in a range from about 5 microns to about 30 microns.
6. The method of claim 4 further comprising forming a ceramic layer on the second anodization layer.
7. The method of claim 6 , wherein the ceramic layer has a thickness in a range from about 100 microns to about 1000 microns.
8. The method of claim 6 , wherein the ceramic layer comprises at least one of Y 2 O 3 , Al 2 O 3 , ZrO 2 , or a combination thereof.
9. The method of claim 4 , wherein an adhesion strength of the aluminum coating is 23-37 MPa.
10. The method of claim 1 , wherein a surface roughness of the metallic article prior to anodization is in a range from about 15 micro-inch to about 300 micro-inch.
11. The method of claim 1 , wherein deionized water sealing is not performed subsequent to anodizing the metallic article.
12. The method of claim 1 , wherein forming the aluminum coating comprises performing electroplating.
13. The method of claim 1 , wherein the chamber component is selected from the group consisting of a showerhead, a cathode sleeve, a sleeve liner door, a cathode base, a chamber liner, and an electrostatic chuck base.
14. The method of claim 1 , wherein the anodizing is performed via oxalic anodization.
15. The method of claim 1 , wherein the first anodization layer has an aspect ratio of an anodization column height to a pore diameter in a range from about 10 to 1 to about 2000 to 1.
16. The method of claim 15 , wherein the pore diameter of the first anodization layer is about 10-50 nm.
17. The method of claim 1 , wherein portions of the aluminum coating infiltrate the plurality of pores in the first anodization layer.
18. The method of claim 1 , wherein forming the aluminum coating comprises performing a high-velocity oxy-fuel spray (HVOF) process.
19. The method of claim 1 , further comprising:
roughening a surface of the metallic article prior to anodizing the metallic article.