Method for forming an electrical contact
A method for forming an electrical contact to a semiconductor structure is provided. The method includes providing a semiconductor structure, providing a metal on an area of said semiconductor structure, wherein said area exposes a semiconductor material and is at least a part of a contact region, converting said metal to a Si-comprising or a Ge-comprising alloy, thereby forming said electrical contact on said area, wherein said converting is done by performing a vapor-solid reaction, whereby said semiconductor structure including said metal is subjected to a silicon-comprising precursor gas or a germanium-comprising precursor gas.
1. A method for forming an electrical contact to a semiconductor structure, the method comprising:
providing a semiconductor structure;
providing a metal on an area of said semiconductor structure, wherein said area exposes a semiconductor material and is at least a part of a contact region; and
converting said metal to a Si-comprising or a Ge-comprising alloy, thereby forming said electrical contact on said area,
wherein said converting is done by performing a vapor-solid reaction, whereby said semiconductor structure including said metal is subjected to a silicon-comprising precursor gas or a germanium-comprising precursor gas.
2. The method according to claim 1 , wherein said metal is nickel.
3. The method according to claim 1 , wherein said vapor-solid reaction is carried out at a temperature in the range of 215° C. to 350° C.
4. The method according to claim 3 , wherein said vapor-solid reaction is carried out at a temperature in the range of 215° C. to 250° C.
5. The method according to claim 4 , wherein said germanium-comprising precursor is GeH 4 .
6. The method according to claim 3 , wherein said vapor-solid reaction is carried out at a temperature in the range of 225° C. to 350° C.
7. The method according to claim 6 , wherein said silicon-comprising precursor is SiH 4 .
8. The method according to claim 1 , wherein said providing said semiconductor structure further comprises:
producing a vertical semiconductor body protruding from said semiconductor substrate, wherein said vertical semiconductor body has a top surface and comprises said contact region on said top surface and wherein the method further comprises, before providing said metal, defining said area on said semiconductor structure.
9. The method according to claim 8 , wherein said producing said vertical semiconductor body comprises depositing epitaxially a semiconductor material on a part of said semiconductor substrate.
10. The method according to claim 9 , wherein said epitaxially deposited semiconductor material comprises Si, Ge or a Group III-V compound semiconductor.
11. The method according to claim 1 , wherein said area exposes said semiconductor material at the bottom of a through-hole in an insulating layer and the method further comprises, after converting said metal, providing a contact metal in said through-hole.
12. The method according to claim 11 , wherein said electrical contact has an upper interface with said contact metal and a lower interface, on said area, with said vertical semiconductor body and wherein said lower interface is planar and the thickness variation of said electrical contact between said upper interface and said lower interface is less than 1 nm.
13. The method according to claim 1 , wherein said electrical contact is a NiGe or NiSi electrical contact.
14. The method according to claim 1 , further comprising pre-treating the semiconductor structure prior to providing said metal.
15. The method according to claim 14 , wherein said pre-treatment is a SiCoNi treatment.
16. The method according to claim 1 , wherein said semiconductor material is InGaAs, GaAs or InAs.
17. The method according to claim 1 , wherein the silicon-comprising precursor gas comprises a silicon halide, tetraethyl orthosilicate, hexamethyldisiloxane, tetraethylsilane, pentamethylsilane, hexamethyldisilane, tetramethylsilane, or methylsilane.
18. The method according to claim 1 , wherein the germanium-comprising precursor gas comprises a germanium halide, digermane, trigermane, isobutylgermane, or tetramethylgermane.