Method for presetting tuner of plasma processing apparatus and plasma processing apparatus
Disclosed is a method for presetting a tuner that matches a power required for plasma emission in a plasma processing apparatus. The method includes: obtaining a relationship of a time lapse from power supply, an emission intensity of plasma, and a setting position of the tuner by emitting plasma; differentiating the emission intensity by time to calculate a time when an increase rate of the emission intensity becomes maximum; and setting the setting position of the tuner at a time, which is obtained by subtracting a time required from the setting of the tuner until the setting is reflected on the emission intensity from the time when the increase rate of the emission intensity becomes maximum, as a preset position.
1. A method for presetting a tuner of a plasma processing apparatus that matches a power required for plasma emission in the plasma processing apparatus including a controller, the method comprising:
generating, by the controller, plasma in a processing chamber of the plasma processing apparatus;
calculating, by the controller, a relationship between a time lapse from power supply and an emission intensity of the plasma, and a relationship between the time lapse from the power supply and a setting position of the tuner in the plasma processing apparatus;
differentiating, by the controller, the emission intensity by time and calculating, by the controller, a time when an increase rate of the emission intensity becomes maximum; and
setting, by the controller, the setting position of the tuner at a time, which is obtained by subtracting a time required from the setting of the tuner until the setting is reflected on the emission intensity from the time when the increase rate of the emission intensity becomes maximum, as a preset position.
2. The method for presetting the tuner of the plasma processing apparatus according to claim 1 , further comprising:
smoothing, by the controller, data representing the relationship between the time lapse from the power supply and the emission intensity by a moving average, and then, differentiating the data by time.
3. A plasma processing apparatus comprising:
a processing container configured to accommodate a processing target object and perform a plasma processing thereon;
a plasma generating mechanism that includes a high frequency generator provided outside the processing container, and generates plasma within the processing container by using high frequency waves generated by the high frequency generator, the high frequency generator including a tuner configured to match a power required for plasma emission; and
a controller configured to control the plasma generating mechanism,
wherein the controller is configured to:
obtain a relationship of a time lapse from power supply, an emission intensity of plasma, and a setting position of the tuner,
differentiate the emission intensity by time to calculate a time when an increase rate of the emission intensity becomes maximum, and
set the setting position of the tuner at a time, which is obtained by subtracting a time required from the setting of the tuner until the setting is reflected on the emission intensity from the time when the increase rate of the emission intensity becomes maximum, as a preset position.