IP Library Granted Patent US 9,678,021
Granted Patent B2
US 9,678,021 · App. 14/821,075 · Granted Jun 13, 2017

Method and apparatus for inspecting defects

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Quick Facts
Patent No.
US 9,678,021
App. No.
14/821,075
Granted
Jun 13, 2017
Kind
B2
Abstract

In optical dark field defect inspection, the present invention provides including: condensing laser emitted from a light source in a line shape; reflecting the laser, with a mirror; irradiating the reflected laser via an objective lens to a sample placed on a table from a vertical direction; condensing reflected scattered light from the sample with the objective lens; shielding diffraction light occurred from a periodical pattern formed on the sample, in the reflected scattered light from the sample and scattered light occurred from the mirror, with a spatial filter; receiving the reflected scattered light from the sample, not shielded with the spatial filter, with an imaging lens, and forming an image of the reflected scattered light; detecting the image of the reflected scattered light; and processing a detection signal obtained by detecting the image of the reflected scattered light and detecting a defect on the sample.

Claims (38)

1. A defect inspecting apparatus comprising:

a table for placing a sample, capable of moving within a plane;

a light source that emits laser;

an optical path branching mirror that branches an optical path of the laser emitted from the light source;

an oblique illuminator that condenses the laser, proceeded in one of optical paths branched with the optical path branching mirror, into a line shape, and irradiates the laser to the sample placed on the table unit from an oblique direction;

a condenser that condenses the laser, proceeded in another one of optical paths branched with the optical path branching mirror, into a line shape;

a mirror that reflects the laser, condensed in a line shape with the condenser, to deflect the optical path of the laser;

an objective lens that receives the laser, with the optical path deflected with the mirror, then irradiates the laser to the sample placed on the table from a vertical direction, and condenses reflected scattered light from the sample irradiated with the laser;

a spatial filter that shields diffraction light, occurred from a periodical pattern formed on the sample, in the reflected scattered light from the sample, condensed with the objective lens, and shields the scattered light occurred from the mirror;

an imaging lens that receives the reflected scattered light from the sample, not shielded with the spatial filter, and forms an image of the reflected scattered light;

a detector that detects the image of the reflected scattered light formed with the imaging lens; and

a signal processor that processes a detection signal obtained by detecting the image of the reflected scattered light with the detector, to detect a defect on the sample,

wherein the objective lens has a condensing lens and a pupil relay lens that re-forms a first pupil, formed with the condensing lens, to form a second pupil.

2. The defect inspecting apparatus according to claim 1 ,

wherein the spatial filter has: a light shield that shields the diffraction light occurred from the periodical pattern formed on the sample; and a light shield that shields the scattered light occurred in the mirror with the laser incident on the mirror and the specular reflection light from the sample, and

wherein the light shield that shields the scattered light has a width larger than a width of the mirror projected on a pupil plane.

3. The defect inspecting apparatus according to claim 1 , wherein the mirror unit and the spatial filter unit are provided on a second pupil plane of the objective lens unit or in the vicinity of the second pupil plane.

4. The defect inspecting apparatus according to claim 1 , further comprising:

a pupil detection system for observation of the second pupil plane formed with the pupil relay lens; and

an image plane observation system for observation of the image of the reflected scattered light formed with the imaging lens.

5. The defect inspecting apparatus according to claim 1 , further comprising an oblique detection optical system that condenses and detects light, reflected and scattered in an oblique direction with respect to the sample, in the reflected scattered light occurred from the sample by illumination in the oblique direction with the oblique illuminator or illumination from a vertical direction via the objective lens with the laser, with the optical path deflected with the mirror.

6. A defect inspecting method comprising:

condensing laser emitted from a light source in a line shape;

reflecting the laser, condensed in the line shape, with a mirror;

irradiating the reflected laser via an objective lens to a sample placed on a table from a vertical direction;

condensing reflected scattered light from the sample, irradiated with the laser from the vertical direction, with the objective lens;

shielding diffraction light occurred from a periodical pattern formed on the sample, in the reflected scattered light from the sample, condensed with the objective lens, and scattered light occurred from the mirror, with a spatial filter;

receiving the reflected scattered light from the sample, not shielded with the spatial filter, with an imaging lens, and forming an image of the reflected scattered light;

detecting the formed image of the reflected scattered light with a detector; and

processing a detection signal obtained by detecting the image of the reflected scattered light with the detector and detecting a defect on the sample,

wherein the reflected scattered light from the sample is condensed with a condensing lens of the objective lens and forming an image on a first pupil plane, and

wherein an image of the reflected scattered light from the sample formed on the first pupil plane is formed on a second pupil plane with a pupil relay lens.

7. The defect inspecting method according to claim 6 , wherein the spatial filter shields the scattered light occurred with the mirror from the laser incident on the mirror and the specular reflection light from the sample, as scattered light occurred from the mirror, with a light shielding unit having a width larger than a width of the mirror unit projected on a pupil plane.

8. The defect inspecting method according to claim 6 , wherein the mirror and the spatial filter are provided on the second pupil plane of the objective lens unit or in the vicinity of the second pupil plane.

9. The defect inspecting method according to claim 6 , further comprising:

observing the second pupil plane formed with the pupil relay lens with a pupil detection system; and

observing the image of the reflected scattered light formed with the imaging lens with an image plane observation system.

10. The defect inspecting method according to claim 6 , further comprising a step of branching laser emitted from the light source, condensing the branched laser in a line shape and irradiating the laser to the sample placed on the table from an oblique direction, and detecting reflected scattered light occurred from the sample from the laser irradiated from the oblique direction, with an oblique detection system provided in a direction inclined with respect to a surface of the sample.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 13, 2015
From: URANO, YUTA; HONDA, TOSHIFUMI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 036319/0183 →