Microphone and method for manufacturing the same
A microphone and method for manufacturing the microphone are provided. The microphone includes a substrate with a penetration aperture, a vibration unit disposed on the substrate to cover the penetration aperture, and a fixed electrode disposed over, and spaced from, the vibration unit. Further, the vibration unit includes a first portion and a second portion disposed on the penetration aperture, and a third portion disposed on the substrate. In addition, the first portion and the third portion are spaced from each other, and the second portion is connected between the first portion and the third portion, and includes a first piezoelectric portion and a second piezoelectric portion.
1. A microphone, comprising:
a substrate that includes a penetration aperture;
a vibration unit disposed over the substrate to cover the penetration aperture; and
a fixed electrode disposed over, and spaced from, the vibration unit,
wherein the vibration unit includes:
a first portion and a second portion disposed over the penetration aperture, and
a third portion disposed on the substrate,
wherein the first portion and the third portion are spaced from each other, and
wherein the second portion is connected between the first portion and the third portion, and includes a first piezoelectric portion and a second piezoelectric portion.
2. The microphone of claim 1 , wherein each of the first portion, the second portion and the third portion include:
a first insulation film;
a second insulation film; and
a vibration film disposed between the first insulation film and the second insulation film.
3. The microphone of claim 2 , wherein the first piezoelectric portion is disposed on an underside of the first insulation film, and the second piezoelectric portion is disposed on the second insulation film.
4. The microphone of claim 3 , wherein the first piezoelectric portion includes:
a first piezoelectric lower electrode;
a first piezoelectric upper electrode; and
a first piezoelectric layer disposed between the first piezoelectric lower electrode and the first piezoelectric upper electrode.
5. The microphone of claim 4 , wherein the second piezoelectric portion includes:
a second piezoelectric lower electrode;
a second piezoelectric upper electrode; and
a second piezoelectric layer disposed between the second piezoelectric lower electrode and the second piezoelectric upper electrode.
6. The microphone of claim 2 , wherein the vibration film is formed of polysilicon or a conductive material.
7. The microphone of claim 1 , wherein the substrate is formed of silicon.
8. The microphone of claim 1 , further comprising:
a supporting layer disposed on the third portion to support the fixed electrode.