Process of surface treatment for wafer
Disclosed is a process of surface treatment of a substrate. The method of treating a surface of a substrate comprises preparing the substrate, and performing an etching process with respect to a surface of the substrate. The etching process comprises a step of introducing etching gas to the surface of the substrate, and the etching gas comprises a halogen compound and a silane compound.
1. A process of surface treatment for a substrate, the method comprising:
preparing the substrate; and
etching a surface of the substrate,
wherein etching the surface of the substrate comprises:
forming an oxide layer on the substrate;
introducing etching as to the surface of the substrate; and
performing a dry etching or a wet etching process with respect to the surface of the substrate,
wherein the substrate comprises a silicon carbide substrate, and
wherein the etching gas comprises a halogen compound and a silane compound.
2. The process of claim 1 , wherein the halogen compound comprises hydrogen chloride (HCl).
3. The process of claim 1 , wherein the silane compound comprises at least one selected from the group consisting of SiHx (x is an integer of 1 to 4), methylchlorosilane (MTS), and tetratrichlorosilane (TCS).
4. The process of claim 1 , wherein the silane compound is introduced at a mole ratio in a range of 0.01 to 1 based on the halogen compound.
5. The process of claim 1 , wherein the etching gas is introduced at a temperature of 1100° C. to 1650° C.
6. A method of fabricating an epitaxial wafer, the method comprising:
preparing a substrate;
etching a surface of the substrate; and
growing an epitaxial layer from the substrate,
wherein etching a surface of the substrate comprises:
forming an oxide layer on the substrate;
introducing etching gas to the surface of the substrate; and
performing a dry etching or a wet etching process with respect to the surface of the substrate,
wherein the substrate comprises a silicon carbide substrate, and
wherein the etching gas comprises a halogen compound and a silane compound.
7. The method of claim 6 , wherein the halogen compound comprises hydrogen chloride (HCl).
8. The method of claim 6 , wherein the silane compound comprises at least one selected from the group consisting of SiHx (x is an integer of 1 to 4), methylchlorosilane (MTS), and tetratrichlorosilane (TCS).
9. The method of claim 6 , wherein the silane compound is introduced at a mole ratio in a range of 0.01 to 1 based on the halogen compound.
10. The method of claim 6 , wherein the etching gas is introduced at a temperature of 1100° C. to 1650° C.
11. The method of claim 6 , wherein the epitaxial layer comprises silicon carbide (SiC).