Semiconductor devices including insulating gates and methods for fabricating the same

1. A semiconductor device comprising:

a first active fin extending in a first direction;

a second active fin, spaced apart from the first active fin in a second direction perpendicular to the first direction, the second active fin extending in the first direction and having a longer side that is shorter than a length of a longer side of the first active fin, wherein the first and second active fins overlap in the second direction;

a first dummy gate extending in the second direction overlapping with a first end of each of the first and second active fins;

a first metal gate extending in the second direction intersecting the first active fin and overlapping with a second end of the second active fin; and

a first insulating gate extending in the second direction intersecting the first and second active fins, respectively,

wherein the first insulating gate extends into the first active fin;

a third active fin spaced apart from the first active fin the first direction, the third active fin extending in the first direction;

a second dummy gate extending in the second direction overlapping the second end of the first active fin; and

a third dummy gate extending in the second direction overlapping the first end of the third active fin.

2. The semiconductor device of claim 1 , wherein a first pitch between the first insulating gate and the first metal gate and a second pitch between the first metal gate and the first dummy gate are different.

3. The semiconductor device of claim 2 , wherein the second pitch is larger than the first pitch.

4. The semiconductor device of claim 1 , wherein the first insulating gate intersects the second active fin.

5. The semiconductor device of claim 1 , further comprising:

a fourth active fin spaced apart from the second active fin in the first direction, the fourth active fin extending in the first direction, the fourth active fin having a longer side that is shorter than a length of a longer side of the third active fin; and

a second metal gate extending in the second direction to intersect the third active fin and overlapping the first end of the fourth active fin.

6. The semiconductor device of claim 5 , further comprising a second insulating gate extending in the second direction intersecting the third and fourth active fins.

7. A semiconductor device comprising:

a first active fin extending in a first direction;

a second active fin spaced apart from the first active fin in the first direction, the second active fin extending in the first direction;

a third active fin spaced apart from the first active fin in a second direction, the third active fin extending in the first direction;

a first dummy gate extending in the second direction perpendicular to the first direction overlapping with a first end of the first active fin, wherein the first dummy gate does not overlap with the third active fin;

a second dummy gate extending in the second direction overlapping a second end of the second active fin facing the first end of the first active fin;

a first normal gate extending in the second direction intersecting the first active fin;

a first insulating gate extending in the second direction intersecting the first and third active fins, respectively;

a second normal gate extending in the second direction intersecting the second active fin; and

a second insulating gate extending in the second direction intersecting the second active fin,

wherein the first insulating gate extends into the first active fin, and the second insulating gate extends into the second active fin, wherein the first and third active fins overlap in the second direction.

8. The semiconductor device of claim 7 ,

wherein either the first normal gate or the first insulating gate overlaps the first end of the third active fin; and

wherein the first dummy gate does not overlap the third active fin.