Silicon carbide semiconductor device and method for producing same

1. A silicon carbide semiconductor device comprising:

a first-conductivity-type substrate of silicon carbide having a first principal surface and a second principal surface opposite the first principal surface;

a first-conductivity-type drift layer of silicon carbide disposed on the first principal surface;

a second-conductivity-type body layer formed on the drift layer, the second conductivity type being different from the first conductivity type;

a first-conductivity-type source region that is in contact with the body layer;

a trench formed into the drift layer through the body layer;

a gate insulating film disposed on an inner wall of the trench;

a gate electrode that is in contact with the body layer via the gate insulating film;

a first-conductivity-type drain region disposed on the second principal surface of the substrate;

an electrical resistance relaxation layer that is in contact with the trench in the drift layer; and

an electrical field relaxation layer that is in contact with a part of a bottom portion of the electrical resistance relaxation layer, and is wider than the electrical resistance relaxation layer in a first direction along the first principal surface and extends for less than an entirety of a length of said first principal surface in the first direction,

wherein the electrical field relaxation layer is 0.05 to 1 μm wider than the first semiconductor region in the first direction.

2. The silicon carbide semiconductor device according to claim 1 , wherein the electrical field relaxation layer has a higher impurity concentration than the electrical resistance relaxation layer.

3. A silicon carbide semiconductor device comprising:

a first-conductivity-type substrate of silicon carbide having a first principal surface and a second principal surface opposite the first principal surface;

a first-conductivity-type drift layer of silicon carbide disposed on the first principal surface of the substrate;

a second-conductivity-type body layer formed on the drift layer, the second conductivity type being different from the first conductivity type;

a first-conductivity-type source region that is in contact with the body layer;

a trench formed into the drift layer through the body layer;

a gate insulating film covering an inner wall of the trench;

a gate electrode that is in contact with the body layer via the gate insulating film;

a first-conductivity-type drain region disposed on the second principal surface of the substrate;

a first-conductivity-type first semiconductor region that is in contact with the trench in the drift layer, and that has a higher concentration of implanted impurities than the drift layer; and

a second-conductivity-type second semiconductor region that is in contact with the first semiconductor region, and is wider than the first semiconductor region in a first direction along the first principal surface and extends for less than an entirety of a length of said first principal surface in the first direction,

wherein the second-conductivity-type second semiconductor region is 0.05 to 1 μm wider than the first semiconductor region in the first direction.

4. The silicon carbide semiconductor device according to claim 3 , wherein the second semiconductor region has a higher impurity concentration than the first semiconductor region.

5. The silicon carbide semiconductor device according to claim 3 , wherein the second semiconductor region is disposed 0.05 to 0.5 μm deeper than a lower portion of the trench.

6. The silicon carbide semiconductor device according to claim 3 , wherein the first semiconductor region has an impurity concentration that is one fifth or smaller than the impurity concentration of the second semiconductor region.

7. The silicon carbide semiconductor device according to claim 3 ,

wherein a periphery portion of the first principal surface of the substrate is recessed, and the recessed portion has a termination structure, and

wherein the second semiconductor region is provided in an active region surrounded by the termination structure, and is absent in the termination of the periphery portion.

8. A method for producing a silicon carbide semiconductor device,

the method comprising the steps of:

(a) forming a third silicon carbide layer on a first principal surface of a first-conductivity-type first silicon carbide layer, the third silicon carbide layer being formed by implanting impurities of a second conductivity type different from the first conductivity type from a first principal surface side of an epitaxial substrate provided with a second silicon carbide layer of the first conductivity type having a lower concentration than the first silicon carbide layer, the impurities being implanted no deeper than the second silicon carbide layer;

(b) forming a fourth silicon carbide layer by implanting impurities of the first conductivity type from a first principal surface side of the third silicon carbide layer, the impurities being implanted no deeper than the depth of the impurities implanted in the step (a);

(c) forming a trench through the third silicon carbide layer into the fourth silicon carbide layer from a first principal surface side of the fourth silicon carbide layer;

(d) forming a fifth silicon carbide layer underneath the trench by implanting impurities of the second conductivity type from the first principal surface side of the third silicon carbide layer; and

(e) forming a sixth silicon carbide layer by obliquely implanting impurities of the first conductivity type between the fifth silicon carbide layer and the trench from a trench surface in the fourth silicon carbide layer,

wherein the fifth silicon carbide layer is wider than fourth silicon carbide layer in a first direction along the first principal surface and extends for less than an entirety of a length of said first principal surface in the first direction,

wherein the fifth silicon carbide layer is 0.05 to 1 μm wider than the first semiconductor region in the first direction.

9. The method according to claim 8 , comprising the step of recessing a periphery of the silicon carbide semiconductor device before the step (a),

wherein the recess is deeper than the impurities of the second conductivity type implanted in the step (a) beneath a lower portion of the fifth silicon carbide layer.

10. The method according to claim 9 , wherein a gate insulating film is formed after the step (e) that is thicker at a lower portion of the trench than at a side wall portion of the trench.

11. The method according to claim 8 , wherein the fifth silicon carbide layer extends so as to overlap with an entirety of a bottom portion of said trench in the first direction.

12. The method according to claim 11 , wherein the fifth silicon carbide layer extends so as to overlap with a part of a side wall of said trench.

13. The silicon carbide semiconductor device according to claim 1 , wherein the electrical field relaxation layer extends so as to overlap with an entirety of a bottom portion of said trench in the first direction.

14. The silicon carbide semiconductor device according to claim 13 , wherein the fifth silicon carbide layer extends so as to overlap with a part of a side wall of said trench.

15. The silicon carbide semiconductor device according to claim 3 , wherein the second-conductivity-type second semiconductor region extends so as to overlap with an entirety of a bottom portion of said trench in the first direction.

16. The silicon carbide semiconductor device according to claim 3 , wherein the fifth silicon carbide layer extends so as to overlap with a part of a side wall of said trench.

17. The method according to claim 8 , wherein the trench has a depth of 0.5 to 3.0 μm.

18. The silicon carbide semiconductor device according to claim 1 , wherein the trench has a depth of 0.5 to 3.0 μm.

19. The silicon carbide semiconductor device according to claim 3 , wherein the trench has a depth of 0.5 to 3.0 μm.