Method of manufacturing transparent electrode film for display and transparent electrode film for display

1. A method for producing a transparent electrode film for display, the method comprising:

forming an electrode pattern by printing a fine electrode pattern on a release film using a conductive ink composition;

forming an insulating layer by applying an insulating resin on the release film on which the fine electrode pattern is formed so as to cover the fine electrode pattern;

forming a substrate layer by laminating a substrate on the insulating layer;

removing the release film; and

removing residue conductive ink composition that is formed of a same material as the electrode pattern and disposed between electrodes of the fine electrode pattern during the step of forming an electrode pattern and remains on the insulating layer after the step of removing the release film, wherein the step of removing residue conductive ink composition includes:

dissolving the residue conductive ink composition using an etching solution, and

pushing liquid that contains both the etching solution and the dissolved residue conductive ink composition using a residue managing member.

2. The method according to claim 1 ,

wherein the insulating resin is a thermosetting resin or UV curable resin.

3. The method according to claim 1 ,

wherein the etching solution comprises at least one of an ammonium carbamate compound, ammonium carbonate compound, ammonium bicarbonate compound, carboxylic acid compound, lactone compound, lactam compound, cyclic acid anhydride compound, acid-base complex, acid-base-alcoholic complex and mercapto compound, and an oxidizing agent.

4. The method according to claim 1 ,

wherein the residue managing member includes at least one of a doctor blade, wiper, and brush.

5. A method for producing a transparent electrode film for display, the method comprising:

forming an electrode pattern by printing a fine electrode pattern on a release film using a conductive ink composition;

forming an insulating layer on the release film on which the electrode pattern has been formed;

forming a substrate layer by laminating a substrate on the insulating layer;

removing the release film;

removing residue conductive ink composition that is formed of a same material as the electrode pattern and disposed between electrodes of the fine electrode pattern during the step of forming an electrode pattern and remains on the insulating layer after the step of removing the release film, wherein the step of removing residue conductive ink composition includes:

dissolving the residue conductive ink composition using an etching solution, and

pushing liquid that contains both the etching solution and the dissolved residue conductive ink composition; and

forming a conductive material to produce a hybrid type transparent electrode film by depositing or printing the conductive material on the fine electrode pattern from which the release film has been removed.

6. The method according to claim 5 ,

wherein the release film is formed by preparing the release film by applying a silicon-based or acryl-based releasing agent on a thermo-resistant film.

7. The method according to claim 5 ,

wherein at the forming a conductive material, the conductive material is ITO, AZO, CNT, graphene, or conductive polymer.