IP Library › Granted Patent US 9,860,981
Granted Patent B2
US 9,860,981 · App. 13/808,911 · Granted Jan 2, 2018

Transparent conductive film and method for producing same

Inventors: Takuro Tanaka (Chiba, JP); Yasuhiko Nakagawa (Chiba, JP); Hiroyuki Iizuka (Chiba, JP); Koji Ohguma (Chiba, JP); Mikio Yamahiro (Chiba, JP)
Assignee: JNC CORPORATION
H05K1/0313C08J7/042G06F3/044H05K3/0064C08J2367/02C08J2433/00G06F2203/04103Y10T156/10Y10T428/1055
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Quick Facts
Patent No.
US 9,860,981
App. No.
13/808,911
Granted
Jan 2, 2018
Kind
B2
Abstract

Provided is a transparent conductive film having multilayer structure, and inconspicuous pattern shape and good visibility. The film includes: transparent base 11 formed of film-like polymer resin; first hard coat layer 12 laminated on the base 11 ; first transparent dielectric layer 13 laminated as required on the layer 12 ; and first transparent conductive layer 14 laminated on the layer 13 . The base 11 has a film thickness of 2 to 250 micrometers. The layer 12 is formed of hardening resin containing inorganic oxide, with refractive index: 1.40 to 1.90 and film thickness: 0.5 to 6 micrometers. The layer 13 is formed of inorganic substance, with refractive index: 1.30 to 1.50 and film thickness: 10 to 50 nanometers. The layer 14 is formed of at least one kind of inorganic oxide, metal and carbon, and patterned, and has a film thickness of 10 nanometers to 2 micrometers.

Claims (28)

1. A transparent conductive film, consisting of:

a transparent base formed of a film-like polymer resin;

a first hard coat layer laminated on one face of the base;

a first transparent dielectric layer optionally laminated on a face of the first hard coat layer on a side opposite to the base; and

a first transparent conductive layer laminated on a face of the first transparent dielectric layer on a side opposite to the first hard coat layer, wherein

the base has a film thickness of 2 to 250 micrometers,

the first hard coat layer is formed of a hardening resin containing an inorganic oxide, and has a refractive index of 1.40 to 1.90 and a film thickness of 0.5 to 6 micrometers, wherein the hardening resin is an ultraviolet curing resin, and the inorganic oxide comprises Al 2 O 3 , SnO 2 , ZrO 2 , TiO 2 , or a composite oxide thereof to adjust the refractive index of the hard coat layer,

the first transparent dielectric layer is formed of an inorganic substance, and has a refractive index of 1.30 to 1.50 and a film thickness of 10 to 50 nanometers, and

the first transparent conductive layer is formed of at least one kind selected from a group of an inorganic oxide, a metal and carbon, and subjected to patterning, and has a film thickness of 10 nanometers to 2 micrometers.

2. The transparent conductive film according to claim 1 , wherein

the base is formed of at least one kind selected from a group of polyethylene terephthalate, polyethylene naphthalate, triacetyl cellulose and polycarbonate,

the first transparent dielectric layer is formed of silicon oxide (SiO 2 ), and

the first transparent conductive layer is formed of at least one kind selected from a group of indium tin oxide, indium zinc oxide, gallium-added zinc oxide, aluminum-added zinc oxide, silver, copper and carbon.

3. An image display apparatus, comprising:

a touch panel having the transparent conductive film according to claim 1 ; and

an image panel arranged on a side opposite to the first hard coat layer of the transparent conductive film.

4. An image display apparatus, comprising:

a touch panel having the transparent conductive film according to claim 2 ; and

an image panel arranged on a side opposite to the first hard coat layer of the transparent conductive film.

5. A method for producing a transparent conductive film, consisting of:

a step of laminating a hard coat layer on one face of a transparent base formed of a film-like polymer resin by a wet coating method;

step of laminating a transparent dielectric layer on a face of the hard coat layer on a side opposite to the base;

a step of laminating a transparent conductive layer on a face of the transparent dielectric layer on a side opposite to the hard coat layer; and

a step of patterning the transparent conductive layer, wherein

the base has a film thickness of 2 to 250 micrometers,

the hard coat layer is formed of a hardening resin containing an inorganic oxide, and has a refractive index of 1.40 to 1.90 and a film thickness of 0.5 to 6 micrometers, wherein the hardening resin is an ultraviolet curing resin, and the inorganic oxide comprises Al 2 O 3 , SnO 2 , ZrO 2 , TiO 2 , or a composite oxide thereof to adjust the refractive index of the hard coat layer,

the transparent dielectric layer is formed of an inorganic substance, and has a refractive index of 1.30 to 1.50 and a film thickness of 10 to 50 nanometers, and

the transparent conductive layer is formed of an inorganic oxide, and has a film thickness of 10 nanometers to 2 micrometers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 9, 2013
From: TANAKA, TAKURO; NAKAGAWA, YASUHIKO; IIZUKA, HIROYUKI; OHGUMA, KOJI; YAMAHIRO, MIKIO
To: JNC CORPORATION
Reel/Frame 029591/0183 →
Priority Claims (1)
JP 2010-156488 · Jul 9, 2010 · national
Continuity (1)
Related Publication 20130113757A1 · May 9, 2013