Thin film transistor with multiple oxide semiconductor layers
A transistor having high field-effect mobility is provided. A transistor having stable electrical characteristics is provided. A transistor having small current in an off state (in a non-conductive state) is provided. A semiconductor device including such a transistor is provided. A first electrode is formed over a substrate, a first insulating layer is formed adjacent to a side surface of the first electrode, and a second insulating layer is formed to cover the first insulating layer and be in contact with at least part of a surface of the first electrode. The surface of the first electrode is formed of a conductive material that does not easily transmit an impurity element. The second insulating layer is formed of an insulating material that does not easily transmit an impurity element. An oxide semiconductor layer is formed over the first electrode with a third insulating layer provided therebetween.
1. A semiconductor device comprising:
a first conductive film;
a second conductive film over the first conductive film;
a first insulating film over the second conductive film;
a first oxide semiconductor film over the first insulating film;
a second oxide semiconductor film over the first oxide semiconductor film;
a source electrode and a drain electrode over the second oxide semiconductor film;
a third oxide semiconductor film over the second oxide semiconductor film, the source electrode and the drain electrode;
a second insulating film over the third oxide semiconductor film; and
a third conductive film over the third oxide semiconductor film with the second insulating film therebetween,
wherein an upper surface of the source electrode is in contact with a bottom surface of the third oxide semiconductor film,
wherein an upper surface of the drain electrode is in contact with the bottom surface of the third oxide semiconductor film, and
wherein a side surface of the second insulating film is aligned with a side surface of the third conductive film.
2. The semiconductor device according to claim 1 ,
wherein the second conductive film comprises indium tin oxide, indium tin oxide containing silicon, phosphorus, boron, nitrogen, or carbon, or indium gallium zinc oxide containing silicon, phosphorus, boron, nitrogen, or carbon.
3. The semiconductor device according to claim 2 ,
wherein the second conductive film comprises indium gallium zinc oxide containing nitrogen.
4. The semiconductor device according to claim 1 ,
wherein an electron affinity of the second oxide semiconductor film is larger than an electron affinity of the first oxide semiconductor film and an electron affinity of the third oxide semiconductor film.
5. The semiconductor device according to claim 1 ,
wherein the first insulating film comprises aluminum nitride, aluminum oxide, aluminum nitride oxide, aluminum oxynitride, magnesium oxide, silicon nitride, or silicon oxide.
6. The semiconductor device according to claim 1 ,
wherein the first conductive film comprises aluminum, chromium, titanium, copper, molybdenum, or tungsten.
7. The semiconductor device according to claim 1 , further comprising:
a third insulating film under the first insulating film;
wherein the third insulating film is in contact with side surfaces of the first conductive film and the second conductive film.
8. A semiconductor device comprising:
a first conductive film;
a second conductive film over the first conductive film;
a first insulating film over the second conductive film;
a first oxide semiconductor film over the first insulating film;
a second oxide semiconductor film over the first oxide semiconductor film;
a source electrode and a drain electrode over the second oxide semiconductor film;
a third oxide semiconductor film over the second oxide semiconductor film, the source electrode and the drain electrode;
a second insulating film over the third oxide semiconductor film;
a third conductive film over the third oxide semiconductor film with the second insulating film therebetween;
a third insulating film over the third conductive film,
wherein the third insulating film covers the third conductive film, the source electrode, the drain electrode, and a side surface of the second insulating film,
wherein an upper surface of the source electrode is in contact with a bottom surface of the third oxide semiconductor film,
wherein an upper surface of the drain electrode is in contact with the bottom surface of the third oxide semiconductor film, and
wherein a side surface of the second insulating film is aligned with a side surface of the third conductive film.
9. The semiconductor device according to claim 8 ,
wherein the second conductive film comprises indium tin oxide, indium tin oxide containing silicon, phosphorus, boron, nitrogen, or carbon, or indium gallium zinc oxide containing silicon, phosphorus, boron, nitrogen, or carbon.
10. The semiconductor device according to claim 9 ,
wherein the second conductive film comprises indium gallium zinc oxide containing nitrogen.
11. The semiconductor device according to claim 8 ,
wherein an electron affinity of the second oxide semiconductor film is larger than an electron affinity of the first oxide semiconductor film and an electron affinity of the third oxide semiconductor film.
12. The semiconductor device according to claim 8 ,
wherein the first insulating film comprises aluminum nitride, aluminum oxide, aluminum nitride oxide, aluminum oxynitride, magnesium oxide, silicon nitride, or silicon oxide.
13. The semiconductor device according to claim 8 ,
wherein the first conductive film comprises aluminum, chromium, titanium, copper, molybdenum, or tungsten.
14. The semiconductor device according to claim 8 , further comprising:
a fourth insulating film under the first insulating film; and
a fifth insulating film over the fourth insulating film and under the first insulating film;
wherein the fourth insulating film is in contact with side surfaces of the first conductive film and the second conductive film,
wherein the fifth insulating film is in contact with a top surface of the fourth insulating film and part of a top surface of the second conductive film,
wherein the fifth insulating film comprises an opening in a region overlapping with the second conductive film,
wherein the third insulating film is in contact with the fifth insulating film in a first region, and
wherein the first region does not overlap with the first insulating film when seen from a direction perpendicular to a surface of the first insulating film.
15. The semiconductor device according to claim 14 ,
wherein the fifth insulating film comprises aluminum oxide, aluminum nitride, aluminum oxynitride, aluminum nitride oxide, gallium oxide, germanium oxide, yttrium oxide, zirconium oxide, lanthanum oxide, neodymium oxide, hafnium oxide, or tantalum oxide.