IP Library › Granted Patent US 9,945,021
Granted Patent B2
US 9,945,021 · App. 14/839,698 · Granted Apr 17, 2018

Wear resistant vapor deposited coating, method of coating deposition and applications therefor

Inventors: Vladimir Gorokhovsky (Lafayette, CO); Brad B. Heckerman (Missoula, MT); Yuhang Cheng (Edina, MN)
Assignee: G&H TECHNOLOGIES, LLC
C23C14/0641C21D6/004C21D6/005C21D6/008C22C14/00C22C19/03C22C38/001C22C38/002C22C38/02C22C38/04C22C38/06C22C38/20C22C38/22C22C38/42C22C38/44C22C38/50C22F1/10C22F1/183C23C8/02C23C8/20C23C8/24C23C8/36C23C14/021C23C14/022C23C14/024C23C14/025C23C14/0605C23C14/067C23C14/0611C23C14/0635C23C14/0676C23C14/0682C23C14/14C23C14/5806C23C14/586C23C14/588C23C14/5826C23C16/0227C23C16/0236C23C16/0272C23C16/0281C23C16/06C23C16/24C23C16/26C23C16/28C23C16/32C23C16/34C23C16/38C23C16/42C23C16/56A61B17/1615A61B2017/1602A61C3/02A61C5/42Y10T428/24975Y10T428/252Y10T428/265Y10T428/30
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Quick Facts
Patent No.
US 9,945,021
App. No.
14/839,698
Granted
Apr 17, 2018
Kind
B2
Abstract

A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.

Claims (27)

1. A method for producing a wear resistant edge applied to a shape memory alloy, wherein the temperature of the shape memory alloy is controlled through the vapor deposition process, the method comprising the steps of:

providing a blank unsharpened substrate capable of electrical conduction by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned substrate;

depositing a metal-ceramic coating on the cleaned blank substrate by a vapor deposition process, the metal-ceramic coating comprising at least one pair of a metallic layer selected from the group consisting of boron, silicon, titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, hafnium, zirconium, and alloys thereof; overlayed by a ceramic layer selected from the group consisting of nitrides, carbides, oxycarbides, oxynitrides, borides, carboborides, borocarbonitrides, silicides, borosilicides and combinations thereof, and the metal-ceramic coating having a hardness of greater than 20 gigapascals, a toughness of greater than 0.05 H 3 /E 2 , and a fine columnar structure;

grinding a sharp flute to produce a sharpened substrate; and

cleaning the sharpened substrate by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned sharpened substrate; and

depositing a top coat by a vapor deposition process overlaying the metal-ceramic coating, the top coat comprising an amorphous diamond-like matrix selected from the group consisting of carbon, boron, silicon, nitrogen, hydrogen, oxygen and transition metals with nanocrystals sized from 1 to 100 nanometers and a friction coefficient of less than 0.3, the top coat imposing a compressive stress of from 0.1 to 8 gigapascals to the metal-ceramic coating.

2. The method of claim 1 , further comprising treating said substrate with said deposited metal-ceramic coating by a process selected from the group consisting of ion nitriding, oxy-nitriding, ion implantation and carburizing.

3. The method of claim 1 , further comprising treating said substrate with said deposited metal-ceramic coating by annealing at a temperature of from about 800 to about 1200° C. in a vacuum, inert atmosphere or in nitrogen for a duration of 30 min to 1 hr followed by quench by direct contact with a cooling media.

4. The method of claim 3 , wherein said substrate with said deposited metal-ceramic coating is further treated at a temperatures of from about 400 to about 700° C. for a duration of about 15 min to 2 hrs to restore shape memory properties of the alloy.

5. The method of claim 3 , further comprising heating the substrate at a temperature of from about 400 to about 700° C. while grinding the flute to restore shape memory properties of the alloy.

6. A method for producing a wear resistant edge applied to a shape memory alloy, wherein the temperature of the shape memory alloy is controlled through the vapor deposition process, the method comprising the steps of:

providing a blank unsharpened substrate capable of electrical conduction by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned substrate;

depositing a metal-ceramic coating on the cleaned blank substrate by a vapor deposition process, the metal-ceramic coating comprising at least one pair of a metallic layer selected from the group consisting of boron, silicon, titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, hafnium, zirconium, and alloys thereof; overlayed by a ceramic layer selected from the group consisting of nitrides, carbides, oxycarbides, oxynitrides, borides, carboborides, borocarbonitrides, silicides, borosilicides and combinations thereof;

treating said substrate by annealing at a temperature of from about 800 to about 1200° C. in a vacuum, inert atmosphere or in nitrogen for a duration of 30 min to 1 hr followed by quench by direct contact with a cooling media;

heating the substrate at a temperatures of from about 400 to about 700° C. for a duration of about 15 min to 2 hrs to restore shape memory properties of the alloy;

grinding a sharp flute to produce a sharpened substrate;

cleaning the sharpened substrate by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned sharpened substrate; and

depositing a top coat by a vapor deposition process overlaying the metal-ceramic coating, the top coat comprising an amorphous diamond-like matrix selected from the group consisting of carbon, boron, silicon, nitrogen, hydrogen, oxygen and transition metals;

wherein the metal-ceramic coating is of a fine columnar structure, and has a hardness of greater than 20 gigapascals and a toughness of greater than 0.05 H 3 /E *2 , and wherein the amorphous diamond-like matrix containing top coat has nanocrystals sized from 1 to 100 nanometers, a friction coefficient of less than 0.3, and imposes a compressive stress of from 0.1 to 8 gigapascals to the metal-ceramic coating.

7. A method for producing a wear resistant edge applied to a shape memory alloy, wherein the temperature of the shape memory alloy is controlled through the vapor deposition process, the method comprising the steps of:

providing a blank unsharpened substrate capable of electrical conduction by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned substrate;

depositing a metal-ceramic coating on the cleaned blank substrate by a vapor deposition process, the metal-ceramic coating comprising at least one pair of a metallic layer selected from the group consisting of boron, silicon, titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, hafnium, zirconium, and alloys thereof; overlayed by a ceramic layer selected from the group consisting of nitrides, carbides, oxycarbides, oxynitrides, borides, carboborides, borocarbonitrides, silicides, borosilicides and combinations thereof;

treating said substrate by annealing at a temperature of from about 800 to about 1200° C. in a vacuum, inert atmosphere or in nitrogen for a duration of 30 min to 1 hr followed by quench by direct contact with a cooling media;

heating the substrate at a temperatures of from about 400 to about 700° C. for a duration of about 15 min to 2 hrs to restore shape memory properties of the alloy while grinding a sharp flute to produce a sharpened substrate;

cleaning the sharpened substrate by applying at least one finishing method selected from the group consisting of sandblasting, chemical cleaning, electrolytic cleaning, grinding, polishing, vibratory tumbling and ion etching to produce a cleaned sharpened substrate; and

depositing a top coat by a vapor deposition process overlaying the metal-ceramic coating, the top coat comprising an amorphous diamond-like matrix selected from the group consisting of carbon, boron, silicon, nitrogen, hydrogen, oxygen and transition metals;

wherein the metal-ceramic coating is of a fine columnar structure, and has a hardness of greater than 20 gigapascals and a toughness of greater than 0.05 H 3 /E *2 , and wherein the amorphous diamond-like matrix containing top coat has nanocrystals sized from 1 to 100 nanometers, a friction coefficient of less than 0.3, and imposes a compressive stress of from 0.1 to 8 gigapascals to the metal-ceramic coating.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2018
From: HECKERMAN, BRAD; GOROKHOVSKY, VLADIMIR; CHENG, YUHANG
To: G&H TECHNOLOGIES, LLC
Reel/Frame 045079/0541 →
Continuity (4)
Continuation 13103871 · May 9, 2011
Division 11804433 · May 17, 2007
Provisional Application 60801142 · May 17, 2006
Related Publication 20160040280A1 · Feb 11, 2016