IP Library › Granted Patent US 9,953,993
Granted Patent B2
US 9,953,993 · App. 15/457,316 · Granted Apr 24, 2018

Semiconductor memory device

Inventors: Tetsuaki Utsumi (Yokohama, JP); Katsuaki Isobe (Yokohama, JP)
Assignee: TOSHIBA MEMORY CORPORATION
H01L27/11556H01L27/1157H01L27/11519H01L27/11524H01L27/11565H01L27/11582H01L27/11526H01L27/11573
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Quick Facts
Patent No.
US 9,953,993
App. No.
15/457,316
Granted
Apr 24, 2018
Kind
B2
Abstract

A semiconductor memory device includes a plurality of word lines stacked in a first direction; a semiconductor pillar extending through the plurality of word lines in the first direction; a source line electrically connected to the semiconductor pillar; and a transistor arranged in the first direction with the plurality of word lines. The transistor includes a gate electrode, source and drain regions positioned on both sides of the gate electrode respectively. The source line is positioned between the transistor and the plurality of word lines, and is electrically connected to one of the source and drain regions.

Claims (67)

1. A semiconductor memory device, the device comprising:

a plurality of word lines stacked in a first direction;

a semiconductor pillar extending through the plurality of word lines in the first direction;

a source line electrically connected to the semiconductor pillar; and

a transistor arranged in the first direction with the plurality of word lines and including a gate electrode, source and drain regions positioned on both sides of the gate electrode respectively,

the source line being positioned between the transistor and the plurality of word lines, and being electrically connected to one of the source and drain regions.

2. The device according to claim 1 , further comprising:

a first interconnect wire provided between the transistor and the source line,

the source line being electrically connected to the one of the source and drain regions via the first interconnect wire.

3. The device according to claim 2 , further comprising:

a first contact plug electrically connecting the first interconnect wire and the source line.

4. The device according to claim 1 , further comprising:

a second contact plug extending in the first direction through the source line and the plurality of word lines, and electrically connected to the other of the source and drain regions; and

a second interconnect wire electrically connected to the second contact plug,

the plurality of word lines being positioned between the second interconnect wire and the source line.

5. The device according to claim 1 , further comprising:

a third contact plug electrically connected to an end portion of the source line, and extending in the first direction,

the end portion of the source line is provided in stairs with end portions of the plurality of word lines.

6. The device according to claim 1 , further comprising:

a fourth contact plug extending in the first direction through the source line and the plurality of word lines, and electrically connected to the one of the source and drain regions;

a fifth contact plug extending in the first direction through the plurality of word lines, and electrically connected to the source line; and

a third interconnect wire electrically connecting the fourth contact plug and the fifth contact plug,

the plurality of word lines being positioned between the third interconnect wire and the source line.

7. The device according to claim 6 , wherein

the fourth contact plug is positioned between the transistor and the third interconnect wire.

8. The device according to claim 6 , wherein

the fourth contact plug and the fifth contact plug include metal.

9. The device according to claim 6 , further comprising:

a fourth interconnect wire provided between the source line and the transistor, and electrically connected to the one of the source and drain regions and to the fourth contact plug,

the fifth contact plug being positioned between the third interconnect wire and the fourth interconnect wire.

10. The device according to claim 6 , further comprising:

a bit line electrically connected to the semiconductor pillar,

the plurality of word lines being positioned between the source line and the bit line, and the third interconnect wire being included in an interconnect layer same as the bit line.

11. The device according to claim 6 , further comprising:

a sixth contact plug extending in the first direction through the source line and the plurality of word lines, and electrically connected to the other of the source and drain regions; and

a fifth interconnect wire electrically connected to the sixth contact plug,

the plurality of word lines being positioned between the fifth interconnect wire and the source line.

12. The device according to claim 11 , wherein

the fifth interconnect wire supplies a predetermined potential to the source line.

13. The device according to claim 11 , further comprising:

a seventh contact plug electrically connected to an end portion of the source line, and extending in the first direction,

the end portion of the source line is provided in stairs with end portions of the plurality of word lines.

14. The device according to claim 1 , wherein

the source line is a plate-shaped conductor crossing the first direction.

15. The device according to claim 14 , wherein

the source line includes metal or conductive polycrystalline silicon.

16. A semiconductor memory device, the device comprising:

a transistor including a control electrode and first and second semiconductor regions positioned on both sides of the control electrode;

a plurality of electrode layers stacked on the transistor;

an interconnect body provided between the transistor and the plurality of electrode layers;

a semiconductor pillar extending in a stacking direction of the plurality of electrode layers through the plurality of electrode layers, and electrically connected to the interconnect body;

a first conductive body extending in the stacking direction through the plurality of electrode layers and the interconnect body, and electrically connected to one of the first and second semiconductor regions;

a second conductive body extending in the stacking direction through the plurality of electrode layers, and electrically connected to the interconnect body; and

a first interconnect wire electrically connecting the first conductive body and the second conductive body,

the plurality of electrode layers being positioned between the interconnect body and the first interconnect wire.

17. The device according to claim 16 , wherein

the first conductive body is positioned between the transistor and the first interconnect wire.

18. The device according to claim 16 , further comprising:

a third conductive body extending in the stacking direction through the plurality of electrode layers and the interconnect body, and electrically connected to the other of the first and second semiconductor regions; and

a second interconnect wire electrically connected to the third conductive body,

the plurality of electrode layers being positioned between the interconnect body and the second interconnect wire.

19. The device according to claim 16 , further comprising:

a third interconnect wire provided between the interconnect body and the transistor, and electrically connected to the one of the first and second semiconductor regions and to the first conductive body,

the second conductive body being positioned between the first interconnect wire and the third interconnect wire.

20. The device according to claim 18 , further comprising:

a fourth conductive body electrically connected to an end portion of the interconnect body, and extending in the stacking direction,

the end portion of the interconnect body being provided in stairs with end portions of the plurality of electrode layers.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043355/0058 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2017
From: UTSUMI, TETSUAKI; ISOBE, KATSUAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 042122/0308 →
Continuity (2)
Provisional Application 62366417 · Jul 25, 2016
Related Publication 20180026044A1 · Jan 25, 2018