Solid-state imaging device and imaging apparatus
A solid-state imaging device includes a first substrate and a second substrate electrically connected to the first substrate. The first substrate includes a first semiconductor layer and one or more first wiring layers. The second substrate includes a second semiconductor layer and one or more second wiring layers. The first photoelectric conversion element overlaps any of the one or more first wiring layers at all positions on the first photoelectric conversion element in a planar view of the first substrate. The second photoelectric conversion element does not overlap any of the one or more first wiring layers at some positions on the second photoelectric conversion element in the planar view of the first substrate.
1. A solid-state imaging device comprising:
a first substrate; and
a second substrate electrically connected to the first substrate by a connecting portion, wherein
circuit elements constituting pixels including first pixels and second pixels are disposed in the first substrate and the second substrate,
the first substrate includes a first semiconductor layer, and one or more first wiring layers which are disposed between the first semiconductor layer and the second substrate,
the second substrate includes a second semiconductor layer, and one or more second wiring layers which are disposed between the second semiconductor layer and the first substrate,
each of the first pixels includes a first photoelectric conversion element that is formed in the first semiconductor layer and configured to convert light into a first electrical signal,
each of the second pixels includes a second photoelectric conversion element that is formed in the first semiconductor layer and configured to convert light into a second electrical signal,
the first photoelectric conversion element overlaps any of the one or more first wiring layers at all positions on the first photoelectric conversion element in a planar view of the first substrate,
the second photoelectric conversion element does not overlap any of the one or more first wiring layers at some positions on the second photoelectric conversion element in the planar view of the first substrate,
the first substrate further includes a light-blocking film configured to block light incident on the second photoelectric conversion element from a surface of the first substrate of an opposite to the connecting portion,
the first semiconductor layer is disposed between the light-blocking film and the one or more first wiring layers,
the second photoelectric conversion element and the first wiring layer are disposed to be adapted to an arrangement of memory elements on the second substrate.
2. The solid-state imaging device according to claim 1 , wherein the first substrate further includes a first control unit that performs a control of outputting only a pixel signal based on the second electrical signal to an outside.
3. The solid-state imaging device according to claim 2 , wherein the first substrate or the second substrate further includes a second control unit that performs a control of outputting only a pixel signal based on the first electrical signal to the outside.
4. The solid-state imaging device according to claim 1 , wherein the second pixels are arranged at an end of a pixel area in which the pixels are arranged.
5. The solid-state imaging device according to claim 1 , wherein the second pixels are arranged at a plurality of positions in a pixel area in which the pixels are arranged.
6. An imaging apparatus comprising the solid-state imaging device according to claim 1 .