Method of applying an organosilane solution to rigid substrates and grout
A stain-treated substrate comprising an extremely thin coating for stain protection. The stain-treated substrate includes substrate material and the extremely thin coating include a molecular layer of organosilane 3-(trimethoxysilyl) propyldimethyl octadecyl ammonium chloride covalently bonded to the surface of the substrate material. The substrate material can include a wide variety of materials including tile, ceramic, glass, stone and marble and can optionally be used in conjunction with a grout mixture including a diluted organosilane mixture.
1. An apparatus comprising a substrate and a coating for stain protection, the apparatus comprising:
the substrate; and
the coating comprising a molecular layer of organosilane 3-(trimethoxysilyl) propyldimethyl octadecyl ammonium chloride wherein the coating is covalently bonded to the substrate, wherein the coating is created by:
preparing a diluted solution of organosilane 3-(trimethoxysilyl) propyldimethyl octadecyl ammonium chloride in a concentration range of between 0.72% and 3.6%;
heating and maintaining the substrate to an above-room temperature comprising a temperature of between 100 degrees Celsius and 120 degrees Celsius;
applying the water-diluted solution to the substrate;
curing the substrate and water-diluted solution until dry and polymerized at the above-room temperature; and
removing excess polymerized solution from the substrate.
2. The apparatus of claim 1 , wherein the substrate comprises one of porcelain, fiberglass, a composite material, cultured marble, a bath tub, a shower tub, a ceramic tile, a porcelain tile, marble, granite, slate, natural stone, vinyl, brick, wood, engineered stone, carpet, and a rug.
3. The apparatus of claim 1 , wherein preparing the diluted solution comprises preparing the water-diluted solution at a concentration of 1.44%.
4. The apparatus of claim 1 , wherein applying the diluted solution to the substrate comprises spraying the solution upon the substrate as an atomized mist.
5. The apparatus of claim 4 , wherein the atomized mist comprises an ideal drip size of less than 50 microns.
6. The apparatus of claim 4 , wherein the atomized mist comprises an ideal drip size of 20 microns.
7. The apparatus of claim 1 , wherein preparing the water-diluted solution comprises maintain a temperature of the water-diluted solution between 25 degrees Celsius and 50 degrees Celsius.
8. The apparatus of claim 1 , wherein preparing the water-diluted solution comprises maintain an ideal temperature of the water-diluted solution between 25 degrees Celsius and 30 degrees Celsius.