IP Library Granted Patent US 7,088,559
Granted Patent B2
US 7,088,559 · App. 10/059,892 · Granted Aug 8, 2006

Integrated interconnect and method of manufacture therefor

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,088,559
App. No.
10/059,892
Granted
Aug 8, 2006
Kind
B2
Abstract

An integrated interface structure for a nested body to provide an electrical connection. The interface structure includes nested bond pads which electrically interface with leads. The nested bond pads are fabricated on a microstructure to provide an interface to drive circuitry for transducer elements of a slider or head supported by the microstructure.

Claims (26)

1. An interconnect assembly for a microstructure comprising:

a base having first and second opposing surfaces, a cavity extending into said base from said first opposing surface, and a trench extending into said base from said first opposing surface, wherein said trench includes a distal end adjacent to said cavity; and

a bond pad formed on a side wall of said cavity adjacent said trench.

2. The interconnect assembly of claim 1 wherein the base includes a lead formed in said trench and conductively coupled to the bond pad on the side wall of said cavity.

3. The interconnect assembly of claim 1 wherein the trench is etched in the base and the bond pad is formed in said etched trench.

4. The interconnect assembly of claim 1 wherein the bond pad includes a raised surface spaced from the side wall of said cavity.

5. The interconnect assembly of claim 1 wherein said cavity is etched and said bond pad is formed on the etched cavity wall.

6. The interconnect assembly of claim 1 wherein the base includes a base portion and a floating portion movable relative to said base portion and said cavity is formed in the floating portion.

7. The interconnect assembly of claim 1 and further comprising the microstructure disposed in said cavity and the microstructure including at least one bond pad to interface with the bond pad formed on the side wall of said cavity.

8. The interconnect assembly of claim 1 wherein the side wall has a generally vertical orientation when the first and second opposing surfaces are orientated generally horizontally.

9. An electrical interconnect of a microstructure comprising:

a frame having a cavity and a trench etched in said frame;

an electrical lead deposited in said trench; and

a bond pad embedded in a side wall of said cavity of said frame, said bond pad being electrically coupled to said electrical lead.

10. The electrical interconnect of claim 9 comprising a plurality of bond pads embedded in said side wall of said cavity.

11. The electrical interconnect of claim 9 and further comprising a microstructure body disposed in said cavity having a bond pad to interface with the bond pad on said side wall of said cavity.

12. The electrical interconnect of claim 11 wherein the microstructure body is a slider including at least one transducer element.

13. The electrical interconnect of claim 9 wherein the frame includes a base portion and a floating portion and said cavity is formed in the floating portion.

14. The electrical interconnect of claim 9 wherein the embedded bond pad is formed in a trench opened to said cavity.

15. An integrated interconnect assembly for a microstructure comprising:

a microstructure body including a microstructure cavity having a bond pad formed on an inner side wall of the microstructure cavity and conductively coupled to a lead embedded below an external surface of the microstructure body.

16. The integrated interconnect of claim 15 wherein the bond pad is formed on an etched cavity wall.

17. The integrated interconnect of claim 15 wherein the lead is formed in an etched trench on the microstructure body.

18. The integrated interconnect of claim 15 and comprising a slider disposed in said microstructure cavity having at least one bond pad.

19. The integrated interconnect of claim 15 wherein the microstructure body includes a floating portion and said microstructure cavity is formed in the floating portion.

20. The integrated interconnect of claim 15 wherein the bond pad is embedded below an etched surface of the inner side wall.

Assignments (6)
RELEASE OF SECURITY INTEREST Recorded Jul 23, 2025
From: THE BANK OF NOVA SCOTIA
To: SEAGATE TECHNOLOGY PUBLIC LIMITED COMPANY; SEAGATE TECHNOLOGY; SEAGATE TECHNOLOGY HDD HOLDINGS; I365 INC.; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL; SEAGATE HDD CAYMAN; SEAGATE TECHNOLOGY (US) HOLDINGS, INC.
Reel/Frame 072193/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS Recorded Jul 19, 2013
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT AND SECOND PRIORITY REPRESENTATIVE
To: SEAGATE TECHNOLOGY LLC; EVAULT INC. (F/K/A I365 INC.); SEAGATE TECHNOLOGY INTERNATIONAL; SEAGATE TECHNOLOGY US HOLDINGS, INC.
Reel/Frame 030833/0001 →
SECURITY AGREEMENT Recorded Mar 24, 2011
From: SEAGATE TECHNOLOGY LLC
To: THE BANK OF NOVA SCOTIA, AS ADMINISTRATIVE AGENT
Reel/Frame 026010/0350 →
RELEASE Recorded Jan 19, 2011
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: SEAGATE TECHNOLOGY HDD HOLDINGS; MAXTOR CORPORATION; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL
Reel/Frame 025662/0001 →
SECURITY AGREEMENT Recorded May 15, 2009
From: MAXTOR CORPORATION; SEAGATE TECHNOLOGY LLC; SEAGATE TECHNOLOGY INTERNATIONAL
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT AND FIRST PRIORITY REPRESENTATIVE; WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT AND SECOND PRIORITY REPRESENTATIVE
Reel/Frame 022757/0017 →
RELEASE OF SECURITY INTERESTS IN PATENT RIGHTS Recorded Dec 21, 2005
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT (FORMERLY KNOWN AS THE CHASE MANHATTAN BANK AND JPMORGAN CHASE BANK)
To: SEAGATE TECHNOLOGY LLC
Reel/Frame 016926/0342 →