Semiconductor device with transistor and capacitor and its manufacture method
View Patent ↗On a semiconductor substrate, a transistor and a capacitor electrically connected to the transistor are formed, the capacitor having two electrodes made of metal and a capacitor dielectric layer between the two electrodes made of oxide dielectric material. A temporary protective film is formed over the capacitor, the temporary protective film covering the capacitor. The semiconductor substrate with the temporary protective film is subjected to a heat treatment in a reducing atmosphere. The temporary protective film is removed. The semiconductor substrate with the temporary protective film removed is subjected to a heat treatment in an inert gas atmosphere or in a vacuum state. A protective film is formed over the capacitor, the protective film covering the capacitor. With these processes, leak current of the capacitor can be reduced.
1. A semiconductor device comprising:
a transistor formed on a semiconductor substrate;
a capacitor electrically connected to said transistor, said capacitor having two electrodes consisting of metal and a capacitor dielectric layer between the two electrodes consisting of oxide dielectric material;
an interlayer insulating film formed on or over said capacitor and having a hydrogen concentration gradually lowering at positions remoter from said semiconductor substrate; and
a protective film formed on or over said interlayer insulating film.
2. A semiconductor device according to claim 1 , wherein the capacitor dielectric layer of said capacitor consists of tantalum oxide.
3. A semiconductor device according to claim 1 , wherein said protective film consists of silicon nitride.
4. A semiconductor device comprising:
a transistor formed on a semiconductor substrate;
a capacitor electrically connected to said transistor, said capacitor having two electrodes consisting of metal and a capacitor dielectric layer between the two electrodes consisting of oxide dielectric material;
an interlayer insulating film formed on or over said capacitor and having a hydrogen concentration gradually lowering at positions remoter from said semiconductor substrate;
a protective film formed on or over said interlayer insulating film; and
a hydrogen barrier layer formed between said interlayer insulating film and said protective film, said hydrogen barrier layer consisting of insulating material harder to transmit hydrogen than said protective film.
5. A semiconductor device according to claim 4 , wherein the capacitor dielectric layer of said capacitor consists of tantalum oxide.
6. A semiconductor device according to claim 4 , wherein said protective film consists of silicon nitride.