Carrier structure for stacked-type semiconductor device, method of producing the same, and method of fabricating stacked-type semiconductor device
View Patent ↗A carrier structure for fabricating a stacked-type semiconductor device includes: a lower carrier that has laminated thin plates and has first openings for mounting first semiconductor packages thereon; and an upper carrier having second openings for mounting second semiconductor packages on the first semiconductor packages. The lower carrier composed of the laminated thin plates realizes an even plate thickness and reduces warps because stress is distributed to the thin plates. This results in an improved production yield. A pattern of the openings in the thin plates of the lower carrier may be formed by etching or electric discharging. The openings thus formed have reduced warps and burrs.
1. A carrier structure for fabricating a stacked-type semiconductor device comprising:
a lower carrier having laminated thin plates and having first openings for mounting first semiconductor packages thereon; and
an upper carrier having second openings for mounting second semiconductor packages on the first semiconductor packages, the lower carrier having at least a magnet that is buried therein.
2. The carrier structure as claimed in claim 1 , wherein the lower carrier comprises a thin film having an opening area smaller than an outer size of the first semiconductor packages, and another thin film that is laminated on the thin film and has an opening area larger than the outer size of the first semiconductor packages.
3. The carrier structure as claimed in claim 1 , the lower carrier having a plurality of magnets that are buried therein.
4. The carrier structure as claimed in claim 1 , wherein the first openings of the lower carrier are arranged in rows and columns.
5. The carrier structure as claimed in claim 1 , the lower carrier having clearance structures for corners of the first semiconductor packages, and the clearance structures are arranged at corners of the first openings.
6. The carrier structure as claimed in claim 5 , wherein the clearance structures are defined by some of the laminated thin plates.
7. The carrier structure as claimed in claim 1 , wherein the first openings are formed by etching or electric discharge machining.
8. The carrier structure as claimed in claim 7 , wherein the laminated thin plates are joined by spot welding.