Method of testing a semiconductor device and suctioning a semiconductor device in the wafer state
A semiconductor device has an alignment mark which can be recognized by a conventional wafer prober. A redistribution layer connects electrodes of the semiconductor device to electrode pads located in predetermined positions of the redistribution layer. Metal posts configured to be provided with external connection electrodes are formed on the electrode pads of the redistribution layer. A mark member made of the same material as the metal posts is formed on the redistribution layer. The mark member serves as an alignment mark located in a predetermined positional relationship with the metal posts.
1. A method of testing semiconductor devices, comprising the steps of:
forming a redistribution layer on the semiconductor devices in a wafer state;
forming a seal resin layer on the redistribution layer so as to encapsulate the semiconductor devices;
forming grooves in the seal resin layer along scribe lines by removing portions of the seal resin after encapsulating the semiconductor devices by the seal resin layer, the grooves extending through the seal resin layer so that an entire bottom of each of the grooves reaches the wafer and the wafer surface is exposed in the entire bottom of each of the grooves;
performing a test on the semiconductor devices in the wafer state while recognizing the wafer exposed at an intersection of the grooves as a reference position; and
separating the wafer into individual semiconductor devices by cutting the wafer along the scribe lines,
wherein the forming grooves includes forming the grooves by a dicing saw to have a depth exceeding a thickness of the seal resin layer.
2. The method as claimed in claim 1 , wherein the step of forming grooves includes the step of forming grooves along scribe lines selected from all of the scribe lines provided for the wafer.