Hydrophilic coating for fuel cell bipolar plate and methods of making the same
View Patent ↗One embodiment disclosed includes a product comprising: a fuel cell component comprising a substrate and a first coating overlying the substrate, the coating comprising a compound comprising at least one Si—O group, at least one polar group and at least one group including a saturated or unsaturated carbon chain.
1. A process comprising:
providing a bipolar plate that comprises a gas flow field defined by a plurality of lands and channels:
forming a first SiO x -based coating derived from a siloxane on at least a portion of the bipolar plate, the first SiO x -based coating comprising Si—OH functional bond groups and Si—CH 3 functional bond groups;
controlling the hydrophilicity and the porosity of the first SiO x -based coating, during formation of the first SiO x -based coating, by regulating the amount of Si—CH 3 functional bond groups present in the first SiO x -based coating; and
post-treating the first SiO x -based coating to introduce polar functional groups onto the first SiO x -based coating.
2. A process as set forth in claim 1 wherein post-treating the first SiO x -based coating comprises exposing the first SiO x -based coating to a plasma comprising oxygen ions.
3. A process as set forth in claim 1 wherein the forming a first SiO x -based coating on a bipolar plate comprises depositing the first SiO x -based coating by physical vapor deposition, chemical vapor deposition, thermal spraying, sol-gel forming, spraying, dipping, brushing, spinning on, or screen printing.
4. A process as set forth in claim 1 wherein the first SiO x -based coating further comprises a polar group comprising a chloride group.
5. A process as set forth in claim 1 further comprising adding to the first SiO x -based coating an electrically conductive material that comprises at least one of Au, Ag, Ru, Rh, Pd, Re, Os, Ir, Pt, rare earth metals, alloys thereof, polymeric carbon or graphite.
6. A process as set forth in claim 1 wherein the bipolar plate comprises a second coating comprising an electrically conductive material, and wherein the second coating overlies the bipolar plate and wherein the first SiO x -based coating overlies the second coating.
7. A process as set forth in claim 1 wherein the siloxane has the formula:
wherein R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 each may be H, O, Cl, or a saturated or unsaturated carbon chain, and wherein R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 may be the same or different.
8. A process as set forth in claim 1 , further comprising:
positioning a porous diffusion media adjacent to the bipolar plate so that fibers from the diffusion media extend through the first SiO x -based coating and provide an electrical flow path through the first SiO x -based coating from the bipolar plate to the diffusion media.
9. A process as set forth in claim 1 wherein post-treating the first SiO x -based coating comprises exposing the first SiO x -based coating to a microwave-generated oxygen plasma environment for up to about 5 minutes.
10. A process comprising:
providing a bipolar plate that comprises a gas flow field defined by a plurality of lands and channels;
forming a first SiO x -based coating over at least a portion of the bipolar plate by plasma assisted chemical vapor deposition of a precursor gas comprising a siloxane and a carrier gas comprising oxygen, wherein the precursor gas and the carrier gas provide a volumetric flow ratio of the siloxane to oxygen;
controlling the volumetric flow ratio of the siloxane to oxygen to affect the hydrophilicity and the porosity of the first SiO x -based coating; and
post-treating the first SiO x -based coating to introduce polar functional groups onto the first SiO x -based coating.
11. A process as set forth in claim 10 wherein the first SiOx-based coating further comprises a polar group comprising a, halide, carboxyl, ketonic or aldehyde functional group.
12. A process as set forth in claim 10 further comprising adding to the first SiO x -based coating an electrically conductive material that comprises Au, Ag, Ru, Rh, Pd, Re, Os, Ir, Pt, rare earth metals, alloys thereof, polymeric carbon or graphite.
13. A process as set forth in claim 10 wherein the bipolar plate comprises a metal.
14. A process as set forth in claim 10 wherein the bipolar plate comprises a polymeric composite material.
15. A process as set forth in claim 10 wherein the bipolar plate comprises a second coating comprising an electrically conductive material and wherein the second coating overlies the bipolar plate and the first SiO x -based coating overlies the second coating.
16. A process as set forth in claim 10 wherein post-treating the first SiO x -based coating comprises exposing the first SiO x -based coating to a microwave-generated oxygen plasma environment for up to about 5 minutes.
17. A process as set forth in claim 10 wherein depositing a first SiO x -based coating comprises depositing the first SiO x -based coating over the plurality of lands and channels.
18. A process as set forth in claim 17 further comprising removing the first SiO x -based coating from the lands.
19. A process as set forth in claim 10 wherein the siloxane comprises hexamethyl disiloxane.
20. A process comprising:
providing a bipolar plate comprising a gas flow field defined by a plurality of lands and channels;
flowing a precursor gas comprising a siloxane and a carrier gas comprising oxygen into a plasma assisted chemical vapor deposition reactor to provide a siloxane to oxygen volumetric flow ratio;
depositing a first SiO x -based coating over at least a portion of the gas flow field by plasma assisted chemical vapor deposition of the precursor gas and the carrier gas during a reactor time period;
controlling the volumetric flow ratio of the siloxane to oxygen to affect the hydrophilicity and the porosity of the first SiO x -based coating;
controlling the reactor time period to affect the thickness of the first SiO x -based coating; and
post-treating the first SiO x -based coating to introduce polar functional groups onto the first SiO x -based coating.
21. A process as set forth in claim 20 wherein the siloxane comprises hexamethyl disiloxane.
22. A process as set forth in claim 20 wherein post-treating the first SiO x -based coating comprises exposing the first SiO x -based coating to a microwave-generated oxygen plasma environment for up to about 5 minutes.
23. A process comprising:
providing a bipolar plate comprising a gas flow field defined by a plurality of lands and channels;
flowing a precursor gas comprising a siloxane and a carrier gas comprising oxygen into a plasma assisted chemical vapor deposition reactor to provide a siloxane to oxygen volumetric flow ratio;
depositing a first SiO x -based coating over at least a portion of the gas flow field by plasma assisted chemical vapor deposition of the precursor gas and the carrier gas during a reactor time period;
controlling the volumetric flow ratio of siloxane to oxygen to affect the hydrophilicity and the porosity of the first SiO x -based coating;
controlling the reactor time period to affect the thickness of the first SiO x -based coating; and
positioning a porous diffusion media adjacent to the bipolar plate so that fibers from the diffusion media extend through the first SiO x -based coating and provide an electrical flow path through the first SiO x -based coating from the bipolar plate to the diffusion media.
24. A process as set forth in claim 23 , wherein the siloxane comprises hexamethyl disiloxane.
25. A process as set forth in claim 23 further comprising post-treating the first SiO x -based coating to introduce polar functional groups onto the first SiO x -based coating.