IP Library Granted Patent US 8,182,884
Granted Patent B2
US 8,182,884 · App. 11/463,386 · Granted May 22, 2012

Process for application of a hydrophilic coating to fuel cell bipolar plates

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Quick Facts
Patent No.
US 8,182,884
App. No.
11/463,386
Granted
May 22, 2012
Kind
B2
Abstract

A process comprising: depositing a coating on a fuel cell bipolar plate using plasma assisted chemical vapor deposition.

Claims (18)

1. A process comprising:

providing a bipolar plate that comprises a plurality of lands and channels;

flowing a precursor gas that comprises a siloxane and a carrier gas that comprises oxygen into a plasma reaction chamber, wherein a volumetric flow rate ratio of the siloxane to the oxygen ranges from about 8% to about 10%;

depositing a coating comprising nodule shaped siloxane-derived nanoparticles over at least a portion of the bipolar plate using plasma assisted chemical vapor deposition of the precursor gas, wherein the siloxane-derived nanoparticles have a size ranging from about 1 to about 100 nm; and

positioning a porous diffusion media adjacent to the bipolar plate so that fibers from the diffusion media extend through the coating and provide an electrical flow path through the coating from the bipolar plate to the diffusion media.

2. A process as set forth in claim 1 wherein the precursor gas comprises hexamethyl disiloxane.

3. A process as set forth in claim 1 further comprising post-treating the coating to add polar functional groups onto the siloxane-derived nanoparticles in the coating.

4. A process as set forth in claim 1 further comprising post-treating the coating comprising exposing the coating to a plasma comprising oxygen ions.

5. A process as set forth in claim 1 further comprising pre-treating the bipolar plate prior to the depositing comprising attaching polar groups to the bipolar plate.

6. A process comprising:

providing a cathode-side bipolar plate and an anode-side bipolar plate that each comprise a plurality of lands and channels;

flowing a precursor gas that comprises a siloxane and a carrier gas that comprises oxygen into a plasma reaction chamber, wherein a volumetric flow rate ratio of the siloxane to the oxygen ranges from about 8% to about 10%;

depositing a first coating that comprises nodule shaped siloxane-derived nanoparticles on at least a portion of the cathode-side bipolar plate using plasma assisted chemical vapor deposition of the precursor gas, wherein the siloxane-derived nanoparticles have a size ranging from about 1 to about 100 nm;

depositing a second coating that comprises nodule shaped siloxane-derived nanoparticles on at least a portion of the anode-side bipolar plate using plasma assisted chemical vapor deposition of the precursor gas, wherein the siloxane-derived nanoparticles have a size ranging from about 1 to about 100 nm, and wherein the second coating is thicker than the first coating;

positioning a first porous diffusion media adjacent to the cathode-side bipolar plate so that fibers from the first diffusion media extend through the first coating and provide an electrical flow path through the first coating from the cathode-side bipolar plate to the first diffusion media;

positioning a second porous diffusion media adjacent to the anode-side bipolar plate so that fibers from the second diffusion media extend through the second coating and provide an electrical flow path through the second coating from the anode-side bipolar plate to the second diffusion media;

positioning the cathode-side bipolar plate and the first porous diffusion media on one side of a membrane-electrode assembly and the anode-side bipolar plate and the second porous diffusion media on the opposite side of the membrane-electrode assembly to form a fuel cell.

7. A process as set forth in claim 6 further comprising masking a portion of the cathode-side or the anode-side bipolar plate prior to depositing.

Assignments (12)
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2014
From: WILMINGTON TRUST COMPANY
To: GM GLOBAL TECHNOLOGY OPERATIONS LLC
Reel/Frame 034184/0001 →
CHANGE OF NAME Recorded Feb 10, 2011
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: GM GLOBAL TECHNOLOGY OPERATIONS LLC
Reel/Frame 025781/0001 →
SECURITY AGREEMENT Recorded Nov 8, 2010
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: WILMINGTON TRUST COMPANY
Reel/Frame 025327/0041 →
RELEASE OF SECURITY INTEREST Recorded Nov 5, 2010
From: UAW RETIREE MEDICAL BENEFITS TRUST
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 025314/0901 →
RELEASE OF SECURITY INTEREST Recorded Nov 4, 2010
From: UNITED STATES DEPARTMENT OF THE TREASURY
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 025245/0587 →
SECURITY AGREEMENT Recorded Aug 28, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UAW RETIREE MEDICAL BENEFITS TRUST
Reel/Frame 023162/0093 →
SECURITY AGREEMENT Recorded Aug 27, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UNITED STATES DEPARTMENT OF THE TREASURY
Reel/Frame 023156/0142 →
RELEASE OF SECURITY INTEREST Recorded Aug 21, 2009
From: CITICORP USA, INC. AS AGENT FOR BANK PRIORITY SECURED PARTIES; CITICORP USA, INC. AS AGENT FOR HEDGE PRIORITY SECURED PARTIES
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 023127/0402 →
RELEASE OF SECURITY INTEREST Recorded Aug 20, 2009
From: UNITED STATES DEPARTMENT OF THE TREASURY
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 023124/0519 →
SECURITY AGREEMENT Recorded Apr 16, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: CITICORP USA, INC. AS AGENT FOR BANK PRIORITY SECURED PARTIES; CITICORP USA, INC. AS AGENT FOR HEDGE PRIORITY SECURED PARTIES
Reel/Frame 022553/0493 →
SECURITY AGREEMENT Recorded Feb 3, 2009
From: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
To: UNITED STATES DEPARTMENT OF THE TREASURY
Reel/Frame 022195/0334 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 25, 2006
From: WINTER, GERHARD; VYAS, GAYATRI; TRABOLD, THOMAS A.; DATTA, REENA L.
To: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
Reel/Frame 018431/0029 →