IP Library Patent Application 11499781
Patent Application
App. No. 11/499,781

Polymer removing apparatus and method for cleaning inside thereof

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Quick Facts
Patent No.
US None
App. No.
11/499,781
Abstract

A rotating-shaft seal section protective plate including a cylindrical section that covers the periphery of part of a rotating shaft, a small-diameter flange-shaped section formed at an end on the rotor side, of the cylindrical section, and a large-diameter flange-shaped section formed at an end on the rotating-shaft seal section side, of the cylindrical section, is disposed between the rotor and the rotating-shaft seal section. The rotating-shaft seal section protective plate divides the interior of a chamber into a portion on the rotor side and a portion on the rotating-shaft seal section side by means of the large-diameter flange-shaped section and leads a liquid injection medium (corresponding to each of a peeling liquid and a cleaning liquid) to the discharge port by means of the small-diameter flange-shaped portion.

Claims (24)

1 . A polymer removing apparatus which removes polymer from each of wafers, comprising:

a chamber whose inside is hollow;

a plurality of nozzles which are disposed over an inner wall of the chamber and inject a liquid or gaseous injection medium to the wafers lying in the chamber;

a discharge port which is disposed inside the chamber and discharges the injection medium to the outside of the chamber;

a rotor which is disposed inside the chamber and accommodates a wafer carrier bearing the wafers therein;

a drive unit which is disposed outside the chamber and rotates the rotor;

a rotating shaft which connects the rotor and the drive unit;

a rotating-shaft seal section which seals between the rotating shaft and the chamber; and

a rotating-shaft seal section protective plate which is disposed between the rotor and the rotating-shaft seal section and protects the rotating-shaft seal section from the injection medium,

wherein the rotating-shaft seal section protective plate includes a cylindrical section which covers the periphery of part of the rotating shaft over its full circumstance, a large-diameter flange-shaped section formed at an end on the rotating-shaft seal section side, of the cylindrical section, and a small-diameter flange-shaped section formed at an end on the rotor side, of the cylindrical section.

2 . A polymer removing apparatus which removes polymer from each of wafers, comprising:

a chamber whose inside is hollow;

a plurality of nozzles which are disposed over an inner wall of the chamber and inject a liquid or gaseous injection medium to the wafers lying in the chamber;

a discharge port which is disposed inside the chamber and discharges the injection medium to the outside of the chamber;

a rotor which is disposed inside the chamber and accommodates a wafer carrier bearing the wafers therein;

a drive unit which is disposed outside the chamber and rotates the rotor;

a rotating shaft which connects the rotor and the drive unit; and

a rotating-shaft seal section which seals between the rotating shaft and the chamber,

wherein at least one of a plurality of the nozzles includes a variable mechanism which changes an injection direction of the injection medium.

3 . A method of cleaning the interior of a polymer removing apparatus, comprising the steps of:

injecting a cleaning liquid to wafers from the periphery of a rotor while rotatably driving the rotor in a state in which a wafer carrier bearing the wafers is being held in the rotor lying inside a chamber, thereby to clean the wafers;

replacing the wafer carrier with a cleaning jig having side faces each shaped in a plane fashion; and

injecting the cleaning liquid to the side faces of the cleaning jig from the periphery of the rotor while rotatably driving the rotor in a state in which the cleaning jig is being accommodated in the rotor lying inside the chamber, thereby to clean the inside of the chamber.

4 . The method according to claim 3 , wherein said chamber inside cleaning step is a step for splashing the cleaning liquid toward the inner wall of the chamber through respective side faces of a polygonal column with powerful impetus by using a jig shaped in the form of a the polygonal column as the cleaning jig.

Assignments (2)
CHANGE OF NAME Recorded Jan 8, 2009
From: OKI ELECTRIC INDUSTRY CO., LTD.
To: OKI SEMICONDUCTOR CO., LTD.
Reel/Frame 022092/0903 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 7, 2006
From: TAMAKI, SADAHARU
To: OKI ELECTRIC INDUSTRY CO., LTD.
Reel/Frame 018166/0700 →