Semiconductor device, layout method and apparatus and program
A semiconductor device, a layout device and a layout method in which, if the size of a via interconnecting a first conductor provided in an interconnect layer and a second conductor which is provided in an interconnect layer different from the interconnect layer of the first conductor and which intersects the first conductor by solid crossing, is not less than the line width of the first conductor, and if, in case the center point of the via is arranged on a center axis along the longitudinal direction of the first conductor, the minimum spacing cannot be maintained between the first conductor and the line neighboring to the first conductor, the center of the via, arranged on the first conductor, is placed with an offset of a predetermined value with respect to the longitudinal center axis of the first conductor, so that a spacing not less than the minimum spacing is maintained between the first conductor and the line neighboring to the first conductor and in the via placement region on the first conductor.
1. A semiconductor device that includes wiring in which signals are carried between elements of the semiconductor device and in which said semiconductor device is constructed in accordance with a minimum wiring spacing requirement, comprising:
a first wiring provided in a first layer;
a second wiring provided in said first layer and arranged parallel to said first wiring;
a third wiring provided in said first layer, arranged parallel to said first and second wirings, and disposed between said first wiring and said second wiring so that a space between said first wiring and said third wiring is larger than a space between said second wiring and said third wiring;
a fourth wiring provided in a second layer; and
a via interconnecting said third wiring and said fourth wiring, said via having a larger width than said third wiring;
wherein a center point of said via is disposed at a location offset from a longitudinal center axis of the third wiring in direction toward said first wiring,
wherein the minimum wiring spacing requirement for said semiconductor device is maintained by having the center point of said via disposed at the location offset from the longitudinal center axis of the third wiring in direction toward said first wiring, and
wherein a size of said via is not changed to a smaller size.
2. The semiconductor device of claim 1 , wherein said space between said second wiring and said third wiring is at least a minimum spacing between wirings in said first layer.
3. The semiconductor device of claim 1 , wherein:
said first layer includes wiring channels disposed at prescribed intervals,
said second and third wirings are disposed in neighboring wiring channels, and
at least one wiring channel is interposed between said first and second wirings.
4. The semiconductor device of claim 1 , wherein a placement region of said via has a side edge aligned with a longitudinal side edge of said third wiring.
5. A method performed by a computer executing computer program code embodied in a computer readable medium, for performing a layout of a semiconductor device for providing wiring in which signals are carried between elements of the semiconductor device, the method provided so as to maintain a minimum wiring spacing requirement for said semiconductor device, said method comprising:
arranging a first wiring in a first layer;
arranging a second wiring in said first layer in a position parallel to said first wiring;
arranging a third wiring in said first layer in a position parallel to said first and second wirings, and disposed between said first wiring and said second wiring so that a space between said first wiring and said third wiring is larger than a space between said second wiring and said third wiring;
arranging a fourth wiring provided in a second layer; and
arranging a via interconnecting said third wiring and said fourth wiring, said via having a larger width than said third wiring;
wherein a center point of said via is disposed at a location offset from a longitudinal center axis of the third wiring in direction toward said first wiring,
wherein the minimum wiring spacing requirement for said semiconductor device is maintained by having the center point of said via disposed at the location offset from the longitudinal center axis of the third wiring in direction toward said first wiring, and
wherein a size of said via is not changed to a smaller size.
6. The method of claim 5 , wherein said space between said second wiring and said third wiring is at least a minimum spacing between wirings in said first layer.
7. The method of claim 5 , wherein:
said first layer includes wiring channels disposed at prescribed intervals,
said second and third wirings are disposed in neighboring wiring channels, and
at least one wiring channel is interposed between said first and second wirings.
8. The method of claim 5 , further comprising aligning a placement region of a side edge of said via with a longitudinal side edge of said third wiring.
9. A computer readable medium embodying computer program code, for performing a layout of a semiconductor device for providing wiring in which signals are carried between elements of the semiconductor device, the method provided so as to maintain a minimum wiring spacing requirement for said semiconductor device, said computer product code, executed by a computer, causing the computer to perform the steps of:
arranging a first wiring in a first layer;
arranging a second wiring in said first layer in a position parallel to said first wiring;
arranging a third wiring in said first layer in a position parallel to said first and second wirings, and disposed between said first wiring and said second wiring so that a space between said first wiring and said third wiring is larger than a space between said second wiring and said third wiring;
arranging a fourth wiring provided in a second layer; and
arranging a via interconnecting said third wiring and said fourth wiring, said via having a larger width than said third wiring;
wherein a center point of said via is disposed at a location offset from a longitudinal center axis of the third wiring in direction toward said first wiring,
wherein the minimum wiring spacing requirement for said semiconductor device is maintained by having the center point of said via disposed at the location offset from the longitudinal center axis of the third wiring in direction toward said first wiring, wherein a size of said via is not changed to a smaller size.
10. The computer readable medium of claim 9 , wherein said space between said second wiring and said third wiring is at least a minimum spacing between wirings in said first layer.
11. The computer readable medium of claim 9 , wherein:
said first layer includes wiring channels disposed at prescribed intervals,
said second and third wirings are disposed in neighboring wiring channels, and
at least one wiring channel is interposed between said first and second wirings.
12. The computer readable medium of claim 9 , further comprising aligning a placement region of a side edge of said via with a longitudinal side edge of said third wiring.