Semiconductor device, manufacturing method of the semiconductor device, and mounting method of the semiconductor device
A semiconductor device, including a semiconductor substrate where a plurality of functional elements is formed; and a multilayer interconnection layer provided over the semiconductor substrate, the multilayer interconnection layer including a wiring layer mutually connecting the plural functional elements and including an interlayer insulation layer, wherein a region where the wiring layer is formed is surrounded by a groove forming part, the groove forming part piercing the multilayer interconnection layer; and the groove forming part is filled with an organic insulation material.
1. A semiconductor device, comprising:
a semiconductor substrate in which a plurality of functional elements are formed;
a multilayer interconnection layer provided over the semiconductor substrate, the multilayer interconnection layer including a plurality of wiring layers mutually connecting the plural functional elements and including a plurality of interlayer insulation layers, the multilayer interconnection layer having a structure in which the plural wiring layers and the plural interlayer insulation layers are stacked on each other; and
a plurality groove forming parts provided in the multilayer interconnection layer outside a wiring region where the plural wiring layers are formed and connected to electrode pads, each of the groove forming parts positioned inside a dicing line provided along a circumference of each functional element, and each of the groove forming parts piercing the plural interlayer insulation layers in the multilayer interconnection layer to reach an upper surface of the semiconductor substrate,
wherein each of the groove forming parts is filled with an organic insulation material and the organic insulation material is provided to cover an upper surface of the multilayer interconnection layer,
wherein the plurality of groove forming parts is formed in the multilayer interconnection layer so as to surround the region where the wiring layer is formed.
2. The semiconductor device, as claimed in claim 1 ,
wherein the groove has width equal to or greater than approximately 2 μm and equal to or smaller than approximately 50 μm.
3. The semiconductor device, as claimed in claim 1 ,
wherein a piercing length of the groove in the multilayer interconnection layer is equal to or greater than approximately 0.1 μm.
4. The semiconductor device, as claimed in claim 1 ,
wherein the organic insulation material is selected from a group consisting of polyimide, benzocyclobutene, phenol resin, and polybenzoxazole.
5. The semiconductor device as claimed in claim 1 ,
wherein an outside connection projection electrode is formed on one end of the metal pole, the one end being exposed from the resin.
6. The semiconductor device as claimed in claim 1 , further comprising:
a first insulation layer opening a plurality of electrode pads formed on the multilayer interconnection layer, the first insulation layer being provided over the multilayer interconnection layer;
a second wiring layer connected to the electrode pads and provided over the first insulation layer;
a metal pole provided on the second wiring layer; and
resin formed over the first insulation layer and the second wiring layer and exposing one end of the metal pole.
7. The semiconductor device, as claimed in claim 6 ,
wherein the resin is selected from a group consisting of polyimide, benzocyclobutene, polybenzoxazole, phenol resin, bismaleimide-triazine resin, and epoxy resin.