Integrated circuit device with electronically accessible device identifier
An semiconductor device having a plurality of fabrication layers. A first region of a first fabrication layer of the semiconductor device is revised. To signal the revision, a connectivity structure in a second region of the first fabrication layer is omitted to interrupt an otherwise continuous signal path that extends through a plurality of interconnection layers of the semiconductor device.
1. A method of indicating a revision of a semiconductor device, the method comprising:
revising a design of a conductive fabrication layer of the semiconductor device; and
after the design of the fabrication layer has been revised, during fabrication of the semiconductor device, forming a connectivity structure in the fabrication layer to form a signal path that extends through a plurality of interconnection layers of the semiconductor device to a voltage node to indicate a revision number,
wherein forming the signal path is performed without omitting any other conductive structures from the fabrication layer.
2. The method of claim 1 , wherein the voltage node is a ground voltage node.
3. The method of claim 1 wherein each of the plurality of interconnection layers is a metal layer.
4. The method of claim 1 wherein forming a connectivity structure comprises disposing a conductive material in a region of the fabrication layer where the connectivity structure is formed.
5. The method of claim 4 wherein disposing a conductive material in a region of the fabrication layer comprises disposing the conductive material in a region that abuts two regions of one of the interconnection layers that are otherwise electrically isolated from one another.
6. The method of claim 1 , wherein the signal path is a first signal path of a plurality of signal paths that each extends through the plurality of interconnection layers of the semiconductor device, and wherein the electric conductivity of each of the plurality of signal paths is used to indicate the revision number associated with the revision of the fabrication layer.