Mirrored-gate cell for non-volatile memory
A memory comprising at least one memory cell operationally connected to a bit line, a source line and a word line. The memory cell comprises a substrate having a first source contact, a second source contact, and a bit contact between the first source contact and the second source contact, a first transistor gate electrically connecting the first source contact and the bit contact and a second transistor gate electrically connecting the bit contact and the second source contact. The word line electrically connects the first transistor gate to the second transistor gate.
1. A memory cell comprising:
a substrate having a first source contact, a second source contact, and a bit contact between the first source contact and the second source contact;
a first transistor gate electrically connecting the first source contact and the bit contact;
a second transistor gate electrically connecting the bit contact and the second source contact; and
a word line electrically connecting the first transistor gate to the second transistor gate.
2. The memory cell of claim 1 wherein the substrate comprises p-doped silicon and the first source contact, second source contact, and bit contact comprise n-doped silicon.
3. The memory cell of claim 1 wherein the word line comprises a first arm connected to a second arm, the first arm electrically connected to the first transistor gate and the second arm electrically connected to the second transistor gate.
4. The memory cell of claim 1 further comprising an insulation element spanning at least the first source contact, the second source contact and the bit contact and separating them from an adjacent memory cell.
5. A memory comprising:
a first source contact, a second source contact, and a third source contact;
a first bit contact and a second bit contact, the first bit contact between the first source contact and the second source contact and the second bit contact between the second source contact and the third source contact;
a first transistor gate spanning and electrically connecting the first bit contact and the first source contact;
a second transistor gate spanning and electrically connecting the first bit contact and the second source contact;
a third transistor gate spanning and electrically connecting the second bit contact and the second source contact;
a fourth transistor gate spanning and electrically connecting the second bit contact and the third source contact;
a first word line electrically connecting the first transistor gate to the second transistor gate; and
a second word line electrically connecting the third transistor gate to the fourth transistor gate.
6. The memory of claim 5 wherein the first source contact, second source contact, third source contact, first bit contact and second bit contact each comprise n-doped silicon.
7. The memory of claim 5 , wherein the memory has one more source contact than it has bit contacts.
8. The memory of claim 5 further comprising a field oxide insulator spanning at least the first source contact, second source contact, third source contact, first bit contact, and second bit contact; and separating them from an adjacent memory cell column.
9. A memory comprising:
a first source contact, a second source contact, and a third source contact;
a first bit contact and a second bit contact, the first bit contact between the first source contact and the second source contact and the second bit contact between the second source contact and the third source contact;
a first transistor gate spanning and electrically connecting the first bit contact and the first source contact;
a second transistor gate spanning and electrically connecting the first bit contact and the second source contact;
a third transistor gate spanning and electrically connecting the second bit contact and the second source contact;
a fourth transistor gate spanning and electrically connecting the second bit contact and the third source contact; and
a field oxide insulator spanning at least the first source contact, second source contact, third source contact, first bit contact and second bit contact and separating them from an adjacent memory cell column.
10. The memory of claim 9 wherein the first source contact, second source contact, third source contact, first bit contact and second bit contact each comprise n-doped silicon.
11. The memory of claim 9 further comprising a first word line electrically connecting the first transistor gate to the second transistor gate and a second word line electrically connecting the third transistor gate to the fourth transistor gate.
12. The memory of claim 9 , wherein the memory has one more source contact than it has bit contacts.
13. A memory comprising:
at least one column having at least one memory cell;
at least one row having at least the one memory cell, the at least one memory cell comprising:
a first source contact, a second source contact, and a bit contact between the first source contact and the second source contact;
a first transistor gate spanning and electrically connecting the first source contact and the bit contact; and
a second transistor gate spanning and electrically connecting the bit contact and the second source contact;
a source line electrically connected to the first source contact and the second source contact of the at least one memory cell;
a bit line electrically connected to the bit contact of the at least one memory cell; and
a word line electrically connecting the first transistor gate and the second transistor gate.
14. The memory of claim 13 further comprising a second column and an insulation element between the first column and the second column, the second column having at least one memory cell.
15. The memory cell of claim 14 wherein the insulation element is a field oxide insulator.
16. The memory of claim 13 further comprising a memory element electrically connecting the bit contact and the bit line.
17. The memory of claim 16 wherein the memory is ST RAM and the memory element is a spin torque element.
18. The memory of claim 16 wherein the memory is RRAM and the memory element is a resistive element.
19. The memory of claim 13 wherein the word line comprises a first arm connected to a second arm, the first arm electrically connected to the first transistor gate and the second arm electrically connected to the second transistor gate.
20. The memory of claim 13 , the at least one memory cell being a first memory cell, with the column further comprising a second memory cell adjacent the first memory cell, the second memory cell comprising:
the second source contact, a third source contact, and a second bit contact between the second source contact and the third source contact;
a third transistor gate spanning and electrically connecting the second bit contact and the second source contact; and
a fourth transistor gate spanning and electrically connecting the second bit contact and the third source contact;
with a second word line electrically connecting the third transistor gate and the fourth transistor gate.
21. The memory of claim 20 wherein the word line comprises a first arm connected to a second arm, the first arm electrically connected to the first transistor gate and the second arm electrically connected to the second transistor gate, and wherein the second word line comprises a third arm connected to a fourth arm, the third arm electrically connected to the third transistor gate and the fourth arm electrically connected to the fourth transistor gate.
22. The memory of claim 20 , the column further comprising a third memory cell adjacent the second memory cell and a fourth memory cell adjacent the third memory cell.
23. The memory of claim 20 , wherein each memory cell has one more source contact than it has bit contacts.