Semiconductor device and method of fabrication
A semiconductor device includes a first die pad, a first semiconductor chip provided on the first die pad, a second die pad, a second semiconductor chip provided on the second die pad, and a sealing resin made of a first resin material, sealing the first die pad, the first semiconductor chip, the second die pad and the second semiconductor chip. A lower surface of the first semiconductor chip is connected to the first die pad. A first portion of a lower surface of the second semiconductor chip is connected to the second die pad, and a second portion not connected to the second die pad of the lower surface of the second semiconductor chip is connected to an upper surface of the first semiconductor chip via a second resin material different from the first resin material.
1. A semiconductor device comprising:
a first die pad;
a first semiconductor chip provided on the first die pad;
a second die pad;
a second semiconductor chip provided on the second die pad; and
a sealing resin, sealing the first die pad, the first semiconductor chip, the second die pad and the second semiconductor chip,
wherein a lower surface of the first semiconductor chip is connected to the first die pad, and
a first portion of a lower surface of the second semiconductor chip is connected to the second die pad, and a second portion not connected to the second die pad of the lower surface of the second semiconductor chip is connected to an upper surface of the first semiconductor chip,
the lower surface of the first die pad is exposed from the sealing resin.
2. The semiconductor device of claim 1 , wherein
the first and second die pads are electrically isolated from each other, and
the first and second die pads are provided at positions different from each other in a vertical direction.
3. The semiconductor device of claim 1 , wherein one of the first and second die pads is grounded.
4. The semiconductor device of claim 1 , wherein
the first semiconductor chip has a high heat generation circuit region having a relatively high amount of heat generated during a circuit operation and a low heat generation circuit region having a relatively low amount of heat generated during the circuit operation.