MAGNETIC TUNNEL JUNCTION CELLS HAVING PERPENDICULAR ANISOTROPY AND ENHANCEMENT LAYER

1 . A magnetic tunnel junction cell comprising:

a ferromagnetic free layer;

an enhancement layer having a thickness of at least about 15 Å;

an oxide barrier layer; and

a ferromagnetic reference layer,

wherein the enhancement layer and the oxide barrier layer are positioned between the ferromagnetic reference layer and ferromagnetic free layer and the oxide barrier layer is positioned adjacent the ferromagnetic reference layer, and

wherein the ferromagnetic free layer, the ferromagnetic reference layer, and the enhancement layer all have magnetization orientations that are out-of-plane.

2 . The magnetic tunnel junction cell according to claim 1 , wherein the enhancement layer is positioned directly adjacent to the ferromagnetic free layer.

3 . The magnetic tunnel junction cell according to claim 1 , wherein the enhancement layer is slightly decoupled from the ferromagnetic free layer.

4 . The magnetic tunnel junction cell according to claim 1 , wherein the enhancement layer is at least about 20 Å thick.

5 . The magnetic tunnel junction cell according to claim 1 , wherein the enhancement layer is from about 15 Å to 20 Åthick.

6 . The magnetic tunnel junction cell according to claim 1 , wherein the enhancement layer comprises NiFe, CoFe, or CoFeB.

7 . The magnetic tunnel junction cell according to claim 1 further comprising a pinning layer directly adjacent the ferromagnetic reference layer.

8 . The magnetic tunnel junction cell according to claim 1 further comprising an insertion layer positioned between the ferromagnetic free layer and the enhancement layer.

9 . The magnetic tunnel junction cell according to claim 8 , wherein the insertion layer comprises tantalum, ruthenium, chromium, or magnesium oxide.

10 . The magnetic tunnel junction cell according to claim 1 , wherein the ferromagnetic free layer and the ferromagnetic reference layer are chosen from:

single layers of TbCoFe, GdCoFe, or FePt; and

laminated layers of Co/PtCo/Ni.

11 . The magnetic tunnel junction cell according to claim 10 , wherein the ferromagnetic free layer and the ferromagnetic reference layer both comprise FePt having an iron (Fe) content of from about 35 to about 60 atomic percent.

12 . The magnetic tunnel junction cell according to claim 10 , wherein the ferromagnetic free layer and the ferromagnetic reference layer both comprise TbCoFe with a terbium (Tb) content from about 20 to about 35 atomic percent and an iron (Fe) content from about 40 to about 75 atomic percent.

13 . A device comprising:

a magnetic tunnel junction cell comprising:

a ferromagnetic free layer;

an enhancement layer having a thickness of at least about 15 Å;

an oxide barrier layer; and

a ferromagnetic reference layer,

wherein the enhancement layer and the oxide barrier layer are positioned between the ferromagnetic reference layer and ferromagnetic free layer and the oxide barrier layer is positioned adjacent the ferromagnetic reference layer, and

wherein the ferromagnetic free layer, the ferromagnetic reference layer, and the enhancement layer all have magnetization orientations that are out-of-plane; and

a transistor,

wherein the transistor is electrically connected to the magnetic tunnel junction cell.

14 . The device according to claim 13 , wherein the enhancement layer is positioned directly adjacent to the ferromagnetic free layer.

15 . The device according to claim 13 , wherein the enhancement layer is at least about 20 Å thick.

16 . The device according to claim 13 , wherein the enhancement layer is from about 15 Å to 20 Åthick.

17 . The device according to claim 13 , wherein the enhancement layer comprises NiFe, CoFe, or CoFeB.

18 . A memory array comprising:

a plurality of parallel conductive bit lines;

a plurality of parallel conductive word lines that are generally orthogonal to the bit lines; and

a plurality of magnetic tunnel junction cells, each magnetic tunnel junction cell comprising:

a ferromagnetic free layer;

an enhancement layer having a thickness of at least about 15 Å;

an oxide barrier layer; and

a ferromagnetic reference layer,

wherein the enhancement layer and the oxide barrier layer are positioned between the ferromagnetic reference layer and ferromagnetic free layer and the oxide barrier layer is positioned adjacent the ferromagnetic reference layer, and

wherein the ferromagnetic free layer, the ferromagnetic reference layer, and the enhancement layer all have magnetization orientations that are out-of-plane,

wherein each of the plurality of magnetic tunnel junction cells are disposed at intersections of the bit lines and word lines.

19 . The memory array according to claim 18 , wherein the enhancement layer is at least about 20 Å thick.

20 . The memory array according to claim 18 , wherein the enhancement layer comprises NiFe, CoFe, or CoFeB.