Manufacturing method of semiconductor integrated circuit device
A method of manufacturing a semiconductor integrated circuit device includes defining a first area by forming a separating area on a substrate, and forming a tunnel film in the first area, a floating gate on the tunnel film, a first electrode in the separating area, a first film on the floating gate, a second film on the first electrode, a control gate on the first film, a second electrode on the second film, and source and drain areas in the first area. The method includes forming a first interlayer film to cover the control gate and the second electrode, forming, in the first interlayer film, a conductive via plug reaching the second electrode, and forming, on the first interlayer film, a second wiring electrically coupled to the second electrode via the conductive via plug, and a first wiring that is capacitively-coupled to the second wiring and to the second electrode.
1. A manufacturing method of a semiconductor integrated circuit device, the manufacturing method comprising:
defining a first element area by forming an element separating area on a semiconductor substrate;
forming a tunnel insulating film in the first element area;
forming a floating gate above the tunnel insulating film and a first electrode pattern in the element separating area;
forming a first insulating film above the floating gate and a second insulating film above the first electrode pattern;
forming a control gate above the first insulating film and a second electrode pattern above the second insulating film;
forming a source area and a drain area in the semiconductor substrate in the first element area;
forming a first interlayer insulating film to cover the control gate and the second electrode pattern above the semiconductor substrate;
forming, in the first interlayer insulating film, a conductive via plug that reaches the second electrode pattern;
forming, above the first interlayer insulating film in the element separating area, a first wiring pattern capacitively-coupled to the second electrode pattern; and
forming, above the first interlayer insulating film, a second wiring pattern electrically coupled to the second electrode pattern via the conductive via plug, and capacitively-coupled to the first wiring pattern.
2. The manufacturing method according to claim 1 , further comprising:
forming a silicide layer on a surface of the second electrode pattern.
3. The manufacturing method according to claim 1 , further comprising:
flattening a surface of the first interlayer insulating film after the forming of the first interlayer insulating film and before the forming of the conductive via plug.
4. The manufacturing method according to claim 1 , further comprising:
defining a second element area by forming the element separating area on the semiconductor substrate; and
forming a semiconductor device including a single-layered gate electrode in the second element area, before the forming of the first interlayer insulating film.