System, method and apparatus for leadless surface mounted semiconductor package
A packaged semiconductor device may include a termination surface having terminations configured as leadless interconnects to be surface mounted to a printed circuit board. A first flange has a first surface and a second surface. The first surface provides a first one of the terminations, and the second surface is opposite to the first surface. A second flange also has a first surface and a second surface, with the first surface providing a second one of the terminations, and the second surface is opposite to the first surface. A die is mounted to the second surface of the first flange with a material having a melting point in excess of 240° C. An electrical interconnect extends between the die and the second surface of the second flange opposite the termination surface, such that the electrical interconnect, first flange and second flange are substantially housed within a body.
1. A method of packaging a semiconductor die (SD), comprising:
(a) placing a first component on an adhesive substrate, the first component comprising the SD mounted to a first element that is selected from a group consisting of a first flange and a printed circuit board (PCB), the first element providing electrical conductivity;
(b) placing a second flange on the adhesive substrate adjacent to but spaced apart from the first component;
(c) electrically interconnecting the SD and the second flange with an electrical interconnect selected from a group consisting of a wire bond and both of at least one conductive layer and at least one dielectric layer;
(d) prior to electrically interconnecting the SD and the second flange, housing at least portions of the first component and the second flange by encapsulation with an encapsulation material to form an assembly surrounding the first component and the second flange; and
(e) housing the first component and the second flange and the electrical interconnect, wherein a surface of the first element that is farthest from the SD and a flange surface of the second flange are coplanar.
2. The method according to claim 1 , wherein the SD is attached to the first flange with a die attach material having a melting point in excess of 240° C.
3. The method according to claim 1 , wherein (a) comprises placing the first component with the SD in contact with the adhesive substrate.
4. The method according to claim 1 , wherein (d) and (e) comprise substantially encapsulating the flanges, SD, and electrical interconnect in a solid material but not encapsulating one unencapsulated surface of the flanges.
5. The method according to claim 1 , wherein (e) comprises mounting a lid to the assembly to house the electrical interconnect in an air cavity such that the electrical interconnect is free of the encapsulation material.
6. The method according to claim 1 , wherein the SD has a thickness of about 3 mils to about 5 mils, wherein the flanges are electrically and thermally conductive and each flange has a thickness of about 30 mils to about 100 mils, and wherein the packaged SD is configured to operate at radio frequencies of about 3 kHz to about 100 GHz.
7. The method according to claim 1 , wherein a flange surface of each of the flanges further comprises an additional conductive layer of material at a termination surface, wherein the flange surface is at an opposite end of the first flange from a die attachment surface of the first flange upon which the first flange is attached to the SD, and wherein the additional conductive layer of the material comprises Sn or NiPdAu and forms terminations that are co-planar along the termination surface to less than about 0.001 inches.
8. The method of providing a panel comprising a plurality of packaged semiconductor dies, including the semiconductor die of claim 1 , wherein (e) of claim 1 occurs before the semiconductor die is singulated from the panel.
9. The method according to claim 8 , further comprising placing a metallic film between the SDs before (d), encapsulating the metallic film in (e), and then cutting the panel at the metallic film wherein a metallic portion is exposed on side walls of each of packaged SDs when the panel is cut, and the metallic film comprises Cu and has a thickness of about 5 mils.
10. The method according to claim 1 , wherein terminations of the SD configured as electrical interconnects are at a termination surface, wherein the SD has no side wall terminations, wherein the termination surface has a first surface area, and wherein the terminations have a second surface area that is in a range of about 0.2% to about 20% of the first surface area.
11. A method of packaging a semiconductor device (SD), comprising:
(a) mounting the SD to a first element selected from a group consisting of a first flange and a circuit board to form a first component;
(b) placing the first component on an adhesive substrate;
(c) placing a second flange on the adhesive substrate adjacent to but spaced apart from the first component;
(d) prior to electrically interconnecting the SD and the second flange, housing at least portions of the SD, the first element, and the second flange by encapsulation with an encapsulation material to form an assembly;
(e) electrically interconnecting the SD and the second flange with an electrical interconnect selected from a group consisting of a wire bond and both of at least one conductive layer and at least one dielectric layer;
(f) adding an additional conductive layer of a material to flange surfaces of the second flange and the first element to form a termination surface with terminations configured as electrical interconnects to be surface mounted to a second circuit board without leads external to the assembly, wherein the flange surface of the first element is at an opposite end of the first element from a die attachment surface of the first element upon which the first element is attached to the SD; and
(g) housing the first element, the second flange, and the electrical interconnect, wherein a surface of the first element that is farthest from the SD and a flange surface of the second flange are coplanar.
12. The method according to claim 11 , wherein (a) comprises attaching the SD to the first flange with a die attach material having a melting point in excess of 240° C.
13. The method according to claim 11 , wherein the SD has a die surface and the second flange has a second flange surface, wherein the die surface and the second flange surface are co-planar.
14. The method according to claim 11 , wherein (g) comprises mounting a lid to the assembly to house the electrical interconnect in an air cavity such that the electrical interconnect is free of the encapsulation material, and the SD has a thickness of about 3 mils to about 5 mils.