Semiconductor device manufacturing method and semiconductor device
To divide a semiconductor wafer by stealth dicing, a test pad in a cutting region and an alignment target are collectively arranged along one side in a width direction of the cutting region, and a laser beam for forming a modified region is irradiated to a position away in plane from the test pad and the alignment target Am. In this manner, defects in cutting shape in a cutting process of a semiconductor wafer using stealth dicing can be reduced or prevented.
1. A method of manufacturing a semiconductor device, comprising the steps of:
(a) providing a semiconductor wafer having:
a substrate comprised of a monocrystalline silicon,
a multiple layer formed on a main surface of the substrate, the multiple layer having a wiring comprised of a first metal, a first insulating film comprised of SiO (silicon oxide), and a second insulating film having a dielectric constant lower than a dielectric constant of the first insulating film,
a first pad comprised of a second metal, and formed on a front surface of the multiple layer, the first pad being arranged in a first region, which is to be obtained as a first semiconductor chip, in the front surface of the multiple layer in a plan view,
a second pad comprised of the second metal, and formed on the front surface of the multiple layer, the second pad being arranged in a second region, which is to be obtained as a second semiconductor chip, in the front surface of the multiple layer in the plan view, and
a third pad comprised of the second metal, and formed on the front surface of the multiple layer, the third pad being arranged in a third region, which is to be removed by using a dicing saw, in the front surface of the multiple layer in the plan view, the third region being located between the first region and the second region in the plan view;
(b) after the step (a), irradiating both sides of the third pad of the semiconductor wafer with a laser beam so as not to contact the first, second and third pads, thereby forming a first amorphous silicon and a second amorphous silicon in the monocrystalline silicon, the laser beam being irradiated along a side of each of the first and second regions in the plan view; and
(c) after the step (b), removing all of the third pad and a part of the multiple layer, which is located between the first amorphous silicon and the second amorphous silicon, by using the dicing saw.
2. The method according to claim 1 , wherein the second insulating film is comprised of SiOC (silicon oxycarbide).
3. The method according to claim 2 ,
wherein the dielectric constant of the first insulating film is between 3.9 and 4.0, inclusive, and
wherein the dielectric constant of the second insulating film is between 2.4 and 3.2, inclusive.
4. The method according to claim 2 , wherein the second insulating film is formed by CVD (Chemical Vapor Deposition) process.
5. The method according to claim 1 ,
wherein the multiple layer further has a third insulating film comprised of SiO (silicon oxide),
wherein, in a cross-sectional view, the second insulating film is located between the first insulating film and the third insulating film, and
wherein the dielectric constant of the second insulating film is lower than a dielectric constant of the third insulating film.
6. The method according to claim 5 , wherein the second insulating film is comprised of SiOC (silicon oxycarbide).
7. The method according to claim 6 ,
wherein the dielectric constant of each of the first and third insulating films is between 3.9 and 4.0, inclusive, and
wherein the dielectric constant of the second insulating film is between 2.4 and 3.2, inclusive.
8. The method according to claim 6 , wherein the second insulating film is formed by CVD (Chemical Vapor Deposition) process.
9. The method according to claim 1 ,
wherein the first metal is copper, and
wherein the second metal is aluminum.
10. The method according to claim 1 ,
wherein the third pad is a test pad,
wherein the first semiconductor chip has an element, and
wherein the test pad is electrically connected with the element of the first semiconductor chip through the wiring.
11. The method according to claim 1 , wherein the semiconductor wafer further has a protective film comprised of SiN (silicon nitride), and formed on the front surface of the multiple layer such that the first, second and third pads are exposed from the protective film.
12. The method according to claim 1 ,
wherein the semiconductor wafer further has a first conductor portion located between the first pad and the third pad, and a second conductor portion located between the second pad and the third pad, and
wherein, in the step (b), the laser beam is irradiated between the first conductor portion and the third pad, and irradiated between the second conductor portion and the third pad.
13. A method of manufacturing a semiconductor device, comprising the steps of:
(a) providing a semiconductor wafer having:
a substrate comprised of a monocrystalline silicon,
a multiple layer formed on a main surface of the substrate, the multiple layer having a wiring comprised of a first metal, and an insulating film comprised of SiOC (silicon oxycarbide),
a first pad comprised of a second metal, and formed on a front surface of the multiple layer, the first pad being arranged in a first region, which is to be obtained as a first semiconductor chip, in the front surface of the multiple layer in a plan view,
a second pad comprised of the second metal, and formed on the front surface of the multiple layer, the second pad being arranged in a second region, which is to be obtained as a second semiconductor chip, in the front surface of the multiple layer in the plan view, and
a third pad comprised of the second metal, and formed on the front surface of the multiple layer, the third pad being arranged in a third region, which is to be removed by using a dicing saw, in the front surface of the multiple layer in the plan view, the third region being located between the first region and the second region in the plan view;
(b) after the step (a), irradiating both sides of the third pad of the semiconductor wafer with a laser beam so as not to contact the first, second and third pads, thereby forming a first amorphous silicon and a second amorphous silicon in the monocrystalline silicon, the laser beam being irradiated along a side of each of the first and second regions in the plan view; and
(c) after the step (b), removing all of the third pad and a part of the multiple layer, which is located between the first amorphous silicon and the second amorphous silicon, by using the dicing saw.
14. The method according to claim 13 , wherein a dielectric constant of the insulating film is between 2.4 and 3.2, inclusive.
15. The method according to claim 13 , wherein the insulating film is formed by CVD (Chemical Vapor Deposition) process.
16. The method according to claim 13 ,
wherein the first metal is copper, and
wherein the second metal is aluminum.
17. The method according to claim 13 ,
wherein the third pad is a test pad,
wherein the first semiconductor chip has an element, and
wherein the test pad is electrically connected with the element of the first semiconductor chip through the wiring.
18. The method according to claim 13 , wherein the semiconductor wafer further has a protective film comprised of SiN (silicon nitride), and formed on the front surface of the multiple layer such that the first, second and third pads are exposed from the protective film.
19. The method according to claim 13 ,
wherein the semiconductor wafer further has a first conductor portion located between the first pad and the third pad, and a second conductor portion located between the second pad and the third pad, and
wherein, in the step (b), the laser beam is irradiated between the first conductor portion and the third pad, and irradiated between the second conductor portion and the third pad.