Semiconductor device and method of using partial wafer singulation for improved wafer level embedded system in package
A semiconductor device includes a semiconductor wafer including a plurality of first semiconductor die. An opening is formed partially through the semiconductor wafer. A plurality of second semiconductor die is disposed over a first surface of the semiconductor wafer. An encapsulant is disposed over the semiconductor wafer and into the opening leaving a second surface of the semiconductor wafer exposed. A portion of the second surface of the semiconductor wafer is removed to separate the first semiconductor die. An interconnect structure is formed over the second semiconductor die and encapsulant. A thermal interface material is deposited over the second surface of the first semiconductor die. A heat spreader is disposed over the thermal interface material. An insulating layer is formed over the first surface of the semiconductor wafer. A vertical interconnect structure is formed around the first semiconductor die. Conductive vias are formed through the first semiconductor die.
1. A semiconductor device, comprising:
a semiconductor wafer including a plurality of first semiconductor die and a trench formed between the plurality of first semiconductor die;
an insulating layer formed over the plurality of first semiconductor die, wherein the insulating layer extends to the trench;
a plurality of second semiconductor die disposed over the plurality of first semiconductor die;
a plurality of first conductive bumps disposed over the plurality of first semiconductor die and outside a footprint of the plurality of second semiconductor die in openings of the insulating layer, wherein a height of the plurality of first conductive bumps is greater than a height of the plurality of second semiconductor die; and
an encapsulant deposited over the semiconductor wafer, the plurality of second semiconductor die, and the plurality of first conductive bumps, wherein the encapsulant extends into the trench and between the insulating layer and plurality of second semiconductor die.
2. The semiconductor device of claim 1 , wherein the plurality of second semiconductor die and the plurality of first conductive bumps are exposed from the encapsulant.
3. The semiconductor device of claim 2 , wherein top surfaces of the plurality of first conductive bumps are coplanar with a top surface of the encapsulant.
4. The semiconductor device of claim 1 , further including a plurality of second conductive bumps disposed between the plurality of first semiconductor die and the plurality of second semiconductor die.
5. The semiconductor device of claim 1 , wherein the encapsulant fills the trench.
6. The semiconductor device of claim 1 , further including a second conductive bump disposed in the trench.
7. A semiconductor device, comprising:
a semiconductor wafer including a plurality of first semiconductor die and a trench formed between the plurality of first semiconductor die;
an insulating layer formed over the plurality of first semiconductor die, wherein the insulating layer extends to the trench
a plurality of second semiconductor die disposed over the plurality of first semiconductor die;
a plurality of first conductive bumps disposed over the plurality of first semiconductor die and outside of a footprint of the plurality of second semiconductor die; and
an encapsulant deposited over the semiconductor wafer, plurality of second semiconductor die, and plurality of first conductive bumps, wherein the encapsulant extends into the trench and between the insulating layer and plurality of second semiconductor die.
8. The semiconductor device of claim 7 , wherein the first conductive bumps are exposed from the encapsulant.
9. The semiconductor device of claim 8 , wherein a top surface of the first conductive bumps is coplanar with a top surface of the encapsulant.
10. The semiconductor device of claim 7 , further including a plurality of second conductive bumps disposed between the plurality of first semiconductor die and the plurality of second semiconductor die.
11. The semiconductor device of claim 7 , wherein the encapsulant fills the trench.
12. The semiconductor device of claim 7 , further including a second conductive bump disposed in the trench.
13. A semiconductor device, comprising:
a semiconductor wafer including a plurality of first semiconductor die and a trench formed between the plurality of first semiconductor die;
a plurality of second semiconductor die disposed over the plurality of first semiconductor die;
a plurality of first conductive bumps disposed over the plurality of first semiconductor die;
a plurality of second conductive bumps disposed outside a footprint of the first semiconductor die and outside a footprint of the second semiconductor die; and
an encapsulant deposited over the semiconductor wafer, plurality of second semiconductor die, plurality of first conductive bumps, and plurality of second conductive bumps, wherein the encapsulant extends into the trench and contacts the first conductive bumps and second conductive bumps.
14. The semiconductor device of claim 13 , wherein a height of the plurality of first conductive bumps is greater than a height of the plurality of second semiconductor die.
15. The semiconductor device of claim 13 , wherein top surfaces of the plurality of first conductive bumps are coplanar with top surfaces of the plurality of second semiconductor die.
16. The semiconductor device of claim 13 , further including a plurality of third conductive bumps disposed between the plurality of first semiconductor die and the plurality of second semiconductor die.
17. The semiconductor device of claim 13 , wherein the second conductive bumps are disposed in the trench.
18. The semiconductor device of claim 13 , further including an insulating layer formed over the plurality of first semiconductor die, wherein the encapsulant extends between the insulating layer and plurality of second semiconductor die.