Apparatus for controlling the placement of micro-objects on a micro-assembler
Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler. The control patterns may be part of a library of control patterns.
1. An apparatus, comprising:
a micro-assembler comprising a plurality of phototransistors and a plurality of capacitors on top of the plurality of phototransistors;
a light emitting device powering the plurality of phototransistors to cause the plurality of capacitors to generate one or more of forces;
a memory configured to store control data;
a processing device, operatively coupled to the memory, the processing device configured to:
detect a set of micro-objects and their positions on the micro-assembler;
identify one or more types of the set of micro-objects;
identify a set of control patterns, for use by the light emitting device, from a control pattern library of the memory based on the set of positions and the one or more types of the set of micro-objects; and
manipulate the set of micro-objects using the set of control patterns, wherein each control pattern of the set of control patterns indicates a force pattern of the one or more of forces generated by the plurality of capacitors on top of the plurality of phototransistors receiving light from the light emitting device based on each control pattern.
2. The apparatus of claim 1 , wherein the processing device is further configured to determine a set of orientations of the set of micro-objects, wherein the set of control patterns is identified further based on the set of orientations of the set of micro-objects.
3. The apparatus of claim 1 , wherein to manipulate the set of micro-objects, the processing device is to:
identify a set of target areas;
associate the set of micro-objects with the set of target areas; and
move the set of micro-objects to the set of target areas.
4. The apparatus of claim 1 , wherein the control pattern library comprises control patterns that cause one or more of electrophoretic forces or dielectrophoretic forces to be exerted on the set of micro-objects.
5. The apparatus of claim 4 , wherein the one or more of electrophoretic forces or dielectrophoretic forces are configured to one or more of:
move the set of micro-objects;
hold the set of micro-objects in an area; and
rotate the set of micro-objects; and
change a set of orientations of the set of micro-objects.
6. The apparatus of claim 1 , wherein to determine a set of positions of the set of micro-objects, the processing device is to:
obtain an image of the set of micro-objects; and
analyze the image to determine the set of positions of the set of micro-objects.
7. The apparatus of claim 1 , wherein the set of positions of the set of micro-objects is determined by determining a set of boundaries of the set of micro-objects.
8. The apparatus of claim 1 , wherein the set of control patterns are one or more of:
automatically generated by a computing device;
based on user input; and
based on previous testing of the set of control patterns.
9. The apparatus of claim 1 , wherein the set of control patterns indicates at least one refresh rate for a first control pattern of the set of control patterns.
10. The apparatus of claim 1 , wherein different control patterns of the set of control patterns are used at different time periods.