Method and device for reducing metal burrs when sawing semiconductor packages
A semiconductor device has a substrate. A conductive layer is formed over the substrate and includes a ground plane. A first tab of the conductive layer extends from the ground plane and less than half-way across a saw street of the substrate. A shape of the first tab can include elliptical, triangular, parallelogram, or rectangular portions, or any combination thereof. An encapsulant is deposited over the substrate. The encapsulant and substrate are singulated through the saw street. An electromagnetic interference (EMI) shielding layer is formed over the encapsulant. The EMI shielding layer contacts the first tab of the conductive layer.
1. A method of making a semiconductor device, comprising:
forming a substrate including a saw street; and
patterning a conductive layer of the substrate to include,
a first ground plane,
a first tab extending from the first ground plane only partially across the saw street, wherein a widest portion of the first tab is disposed outside of the saw street and a thinner portion of the first tab is located between the widest portion and the saw street,
a second ground plane, wherein the first tab extends toward the second ground plane, and
a plurality of second tabs extending from the second ground plane toward the first ground plane, wherein each of the second tabs is offset from the first tab.
2. The method of claim 1 , further including patterning the first tab to include a rectangular portion outside the saw street.
3. The method of claim 1 , further including patterning the first tab to include an elliptical portion.
4. A method of making a semiconductor device, comprising:
forming a first conductive layer; and
patterning the first conductive layer to include,
a first ground plane,
a second ground plane, and
a first tab extending from the first ground plane toward the second ground plane, wherein the first tab extends only partially across a saw street between the first ground plane and second ground plane such that a gap remains between an end of the first tab and the second ground plane.
5. The method of claim 4 , further including patterning the first tab to include a first width where the first tab meets the first ground plane and a second width less than the first width.
6. The method of claim 4 , further including patterning the first tab to include a triangular portion.
7. The method of claim 4 , further including patterning the first tab to include a trapezoidal portion.
8. The method of claim 4 , further including patterning the first conductive layer to include a second tab extending from the second ground plane toward the first ground plane.
9. The method of claim 8 , further including patterning the first conductive layer with the first tab and second tab aligned to each other.
10. The method of claim 4 , further including patterning the first conductive layer to include a plurality of second tabs extending from the second ground plane toward the first ground plane.
11. The method of claim 10 , wherein each of the second tabs is offset from the first tab.
12. A semiconductor substrate, comprising:
a saw street; and
a conductive layer including,
a first ground plane,
a first tab extending from the first ground plane only partially across the saw street, wherein a widest portion of the first tab is disposed outside of the saw street and a thinner portion of the first tab is located between the widest portion and the saw street,
a second ground plane, wherein the first tab extends toward the second ground plane, and
a plurality of second tabs extending from the second ground plane toward the first ground plane, wherein each of the second tabs is offset from the first tab.
13. The semiconductor substrate of claim 12 , wherein the first tab includes a rectangular portion outside the saw street.
14. The semiconductor substrate of claim 12 , wherein the first tab includes an elliptical portion.
15. A semiconductor substrate, comprising:
a plurality of insulating layers;
a first conductive layer formed between two of the plurality of insulating layers; and
a second conductive layer formed over the plurality of insulating layers, wherein the second conductive layer is patterned to form,
a first ground plane disposed adjacent to a saw street of the substrate,
a second ground plane disposed adjacent to the saw street opposite the first ground plane, and
a first tab extending from the first ground plane and only partially across the saw street toward the second ground plane such that a gap remains between an end of the first tab and the second ground plane.
16. The semiconductor substrate of claim 15 , wherein the first tab includes a first width where the first tab meets the first ground plane and a second width less than the first width.
17. The semiconductor substrate of claim 15 , wherein the first tab includes a triangular portion.
18. The semiconductor substrate of claim 15 , wherein the first tab includes a trapezoidal portion.
19. The semiconductor substrate of claim 15 , further including a plurality of second tabs extending from the second ground plane toward the first ground plane.
20. The semiconductor substrate of claim 19 , wherein each of the second tabs is offset from the first tab.