Patent Assignment
Reel/Frame 007153/0152
Assignment of Assignor's Interest
Recorded: 1994-09-30
Pages: 5
Assignor
NALCO CHEMICAL COMPANY
Executed: 1994-08-05
Assignee
RODEL, INC.
451 BELLEVUE ROAD DIAMOND STATE INDUSTRIAL PARK NEWARK, DE 19713
Covered Properties
(7)
Process for Polishing Semi-Conductor Materials
Patent:
4,169,337 →
Application:
05/891,665 →
Silica Sol Compositions for Polishing Silicon Wafers
Patent:
4,462,188 →
Application:
06/390,726 →
Aqueous Silica Compositions for Polishing Silicon Wafers
Patent:
4,588,421 →
Application:
06/736,056 →
Concentrated Lapping Slurries
Patent:
4,752,628 →
Application:
07/050,840 →
Lapping Slurry Compositions with Improved Lap Rate
Patent:
4,867,757 →
Application:
07/242,231 →
Cleaning of Silicon Wafers with an Aqueous Solution of Koh and a Nitrogen-Containing Compound
Patent:
4,964,919 →
Application:
07/291,129 →
Low Sodium, Low Metals Silica Polishing Slurries
Patent:
5,230,833 →
Application:
07/932,284 →
Related Assignments
(6)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
May 18, 1984
From: PAYNE, CHARLES C.
To: NALCO CHEMICAL COMPANY OAK BROOK ILLINOIS A CORP OF DE
Reel/Frame 004256/0088 →
Assignment of Assignors Interest.
May 20, 1985
From: PAYNE, CHARLES C.
To: NALCO CHEMICAL COMPANY
Reel/Frame 004406/0854 →
Assignment of Assignors Interest.
Sep 9, 1988
From: PAYNE, CHARLES C.
To: NALCO CHEMICAL COMPANY, NAPERVILLE, ILLINOIS, A DELAWARE CORP
Reel/Frame 004934/0612 →
Assignment of Assignors Interest.
Dec 27, 1988
From: PAYNE, CHARLES C.
To: NALCO CHEMICAL COMPANY, A DE. CORP.
Reel/Frame 005011/0473 →
Assignment of Assignor's Interest
Feb 9, 2000
From: RODEL, INC.
To: RODEL HOLDINGS, INC.
Reel/Frame 010579/0674 →
Change of Name
Jun 15, 2004
From: RODEL HOLDINGS, INC.
To: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
Reel/Frame 014725/0685 →