Patent Assignment
Reel/Frame 008262/0358
Assignment of Assignor's Interest
Recorded: 1996-11-14
Pages: 6
Assignors
HAYASHI, KENRO
Executed: 1996-10-28
TAKEDA, RYUJI
Executed: 1996-10-28
CHAKI, KATSUHIRO
Executed: 1996-10-28
XIN, PING
Executed: 1996-10-28
YOSHIKAWA, JUN
Executed: 1996-10-28
SAITO, HIROYUKI
Executed: 1996-10-28
Assignee
TOSHIBA CERAMICS CO., LTD.
26-2, NISHI-SHINJUKU 1-CHOME, SHINJUKU-KU, TOKYO, JAPAN
Covered Property
(1)
Manufacturing Method of a Silicon Wafer Having a Controlled Bmd Concentration
Patent:
5,788,763 →
Application:
08/612,214 →
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
May 29, 1996
From: HAYASHI, KENRO; TAKEDA, RYUJI; CHAKI, KATSUHIRO; SAITO,HIROYUKI
To: TOSHIBA CERAMICS CO.,LTD.
Reel/Frame 007980/0623 →
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →