Patent Assignment
Reel/Frame 008402/0699
Assignment of Assignor's Interest
Recorded: 1997-01-09
Pages: 3
Assignors
MATSUSHITA, JUNICHI
Executed: 1997-01-06
YOSHIKAWA, JUN
Executed: 1997-01-06
SANADA, MASAYUKI
Executed: 1997-01-06
SHIMIZU, TATSUYA
Executed: 1997-01-06
Assignee
TOSHIBA CERAMICS CO., LTD.
26-2, NISHI-SHINJUKU 1-CHOME, SHINJUKU-KU, TOKYO, JAPAN
Covered Property
(1)
Hydrogen Heat Treatment Method of Silicon Wafers Using a High-Purity Inert Substitution Gas
Patent:
6,066,579 →
Application:
08/781,026 →
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →