Assignment of Assignor's Interest

Recorded: 1998-02-13 Pages: 3

Assignor

LI, WEIMIN

Executed: 1998-02-10

Assignee

MICRON TECHNOLOGY, INC.

8000 S. FEDERAL WAY, BOISE, IDAHO, 83706

Covered Property (1)

In Situ Plasma Pre-Deposition Wafer Treatment in Chemical Vapor Deposition Technology for Semiconductor Integrated Circuit Applications

Patent: 6,136,690 →

Application: 09/023,523 →

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.